浸没式光刻中浸液控制单元的液体供给及密封研究
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摘要
本论文以浸没式光刻中的浸液控制单元的液体供给及密封为主要研究对象,针对浸液控制单元的曝光流场流动状态以及浸液控制单元与硅片之间的缝隙流场动态密封技术展开研究,对浸液控制单元及液体供给系统进行设计、制造、优化和集成,为研制满足工程化需要的浸没式光刻机浸液供给系统提供技术储备。论文首先建立了浸液控制单元缝隙流场的注液、流动和回收过程的数值仿真模型,对了不同注液条件下流场的流动状态与更新过程进行了仿真分析,确定了恒压双侧对称注液的浸液控制单元注液方式；其次,对浸液控制单元的缝隙流场动态密封进行了实验研究,在获得流场状态与更新效率等密封所需参数的基础上,建立了浸液控制单元非接触动态密封条件下硅片的临界运动速度预测模型,对硅片临界扫描速度进行了分析预测,其结果与实验测试结果基本吻合,以此为基础,提出了浸液控制单元流场动态密封的优化设计方法；最后,以优化设计方法为指导,设计了非接触密封结构,研制出多种不同结构的浸液控制单元试验样机,并与光刻机主机企业SMEE合作,完成了浸液控制单元及液体供给系统在浸没式光刻机实验系统上的集成和测试,结果表明浸液控制单元的动态密封性能可满足200mm/s硅片扫瞄速度的动态密封要求,所研制的浸没式光刻液体供给系统,可满足浸液控制单元液体注入与回收压力的稳定性控制要求。
本论文第一章主要介绍了在半导体生产领域广为应用的光学平板印刷术基本原理,及其演变历程和未来的发展方向,并着重介绍了其中具有巨大潜力的下一代光刻技术——浸没式光刻技术。结合国内外的现有文献资料,分析和归纳了浸没式光刻技术的研究热点与技术难题,介绍了主要研发机构的进展,确定了以浸没式光刻中的液体控制单元的液体供给及密封为主要对象的研究方向。
本论文第二章详细介绍了浸没控制系统的运动实验平台的硬件结构与控制系统构架,并设计制造了浸没液体的管路系统,实现了具有可控流量压力的浸没液体注入、密封气体注入、以及气液混合物的回收过程。通过研究浸没式曝光过程中的流场需求,设计了具有双层气体密封和气液混合物回收的基本结构的液体控制单元,初步实现了浸液控制单元的主体结构,为后面的结构设计优化提供实验条件。
本论文第三章讨论了流体注入对浸液控制单元密封流场影响。以保护流场光学特性为根本目的,在浸液控制单元结构优化过程中,考察了不同的液体注入角度与注液口数量下的流场内部流体流线分布,以及流场压力分布和速度分布。通过对于注液过程的分析和抽象,建立了浸液控制单元缝隙流场的注液、流动、回收过程的数值仿真模型,分析了不同注液条件下浸没液体的流动状态与更新过程。
本论文第四章分析了浸液控制单元非接触动态密封条件下硅片的临界运动速度的预测方法。通过实验结果的研究,对浸没液体注入、曝光流场更新、浸没液体回收等区域进行分段处理,结合试验确定节流系数的数值,建立了硅片临界运动速度模型。利用甘油和去离子水按照一定组成配比混合而成的不同黏度液体,试验验证了模型的可靠性。此模型可作为浸液控制单元设计的有益工具,为浸没系统的总体设计提供依据,同时为高折射率、低吸收率的浸没液体的选择提供参考数据。
本论文第五章详细介绍了浸液控制单元样机在流道结构、密封结构、气液混合物回收结构、浸没液体注入方式、以及样机安装镜头夹持等方面进行的改进和优化。说明了浸液控制单元以先功能实现、而后性能优化为主要特点的研发过程,实现了浸没液体全周连续回收口和全周连续气密封结构,完成同合作单位的浸没式光刻试验平台集成和测试。
本论文第六章为结论与展望,说明了论文的主要及进展、本课题的主要创新点、以及课题还需要进一步完善和深入研究的内容。
Immersion lithography seeks to extend the resolution of optical lithography by filling the gap between the final optical element and the wafer with a liquid characterized by a high index of refraction. During the scanning and exposure process, immersion liquid is injected into the space between wafer and lens with certain inlet pressure and angle. Because the liquid will act as a lens component during the lithographic process, it must maintain high uniform optical quality. One source of optical degradation may be due to liquid contamination by chemical products or impurities during exposure period. Immersion liquid renovation is probably the best solution. The semiconductor industry demands high throughput, leading to relatively large wafer scanning velocities and accelerations. For higher scanning velocities, an issue that has been identified is the deposition of the immersion liquid while confining a relatively small amount of liquid to the under-lens region. Liquid loss occurs at the receding contact line that forms when a substrate is withdrawn from a liquid, which potentially leads to defects on printed patterns.
In this dissertation, the liquid dispensing structure and noncontact sealing mechanism of the immersion unit for immersion lithography is systematically investigated, focusing on the mechanism designing, processing, testing, numerical simulation and performance optimization. Also, a pipeline supplying system is designed and optimized, compatible with the immersion unit, preparing for the industrial implementation of immersion lithography manufacturing equipment. Firstly, a numerical model is built to simulate the liquid dispense-flow-collection procedure, based on which, the flow state and the renovating cycle are studied. Secondly, a noncontact sealing mechanism is designed, upon which, a new liquid injection and collection model with analytic solutions is presented and compared with experimental results. Finally, according to the principles obtained, immersion unit prototype and its revised editions are designed and manufactured. After performance testing and optimization, the dynamic sealing ability for immersion unit is proved.
The main contents of this dissertation are briefly stated as the followings:
Study on liquid dispensing structure and flow state within under-lens region. Three-dimensional computational fluid dynamics models are built to simulate the liquid dispense-flow-collection procedure, featuring flow field stream patterns, lens normal and shear pressure, considering fluid injecting velocity, dispense ports quantity, and direction angles. Compared with experimental results, refreshing cycle time and velocity distribution are investigated, presenting theoretical support for system optimization and compatibility
Study on dynamic sealing for the gap flow field boundary. A noncontact sealing method is studied, aiming at avoiding the liquid leaking on wafer motion and the liquid fulfillment beneath the lens. As new liquid injection and collection model with analytic solutions is presented and compared with experimental results, in which the critical velocity for liquid loss is mainly a function of the vacuum degree, the injection flow rate, the properties of the immersion liquid. This correlation allows the critical velocity to be predicted with a given gap height between wafer and lens using only a measurement of the injection speed and knowledge of the fluid properties. This correlation represents a useful tool that can serve to approximately guide the development of fluid control for immersion systems as well as to evaluate alternative immersion fluid candidates to minimize liquid deposition while maximizing throughput.
Study on immersion unit performance testing and pipeline supplying system optimization. Steady-state operating performance for immersion unit prototype is carried out to obtain the designing principles of low-pressure noncontact sealing element. A pipeline supplying system is exploratory designed and built, compatible with the input interface of immersion unit.
本论文第一章主要介绍了在半导体生产领域广为应用的光学平板印刷术基本原理,及其演变历程和未来的发展方向,并着重介绍了其中具有巨大潜力的下一代光刻技术——浸没式光刻技术。结合国内外的现有文献资料,分析和归纳了浸没式光刻技术的研究热点与技术难题,介绍了主要研发机构的进展,确定了以浸没式光刻中的液体控制单元的液体供给及密封为主要对象的研究方向。
本论文第二章详细介绍了浸没控制系统的运动实验平台的硬件结构与控制系统构架,并设计制造了浸没液体的管路系统,实现了具有可控流量压力的浸没液体注入、密封气体注入、以及气液混合物的回收过程。通过研究浸没式曝光过程中的流场需求,设计了具有双层气体密封和气液混合物回收的基本结构的液体控制单元,初步实现了浸液控制单元的主体结构,为后面的结构设计优化提供实验条件。
本论文第三章讨论了流体注入对浸液控制单元密封流场影响。以保护流场光学特性为根本目的,在浸液控制单元结构优化过程中,考察了不同的液体注入角度与注液口数量下的流场内部流体流线分布,以及流场压力分布和速度分布。通过对于注液过程的分析和抽象,建立了浸液控制单元缝隙流场的注液、流动、回收过程的数值仿真模型,分析了不同注液条件下浸没液体的流动状态与更新过程。
本论文第四章分析了浸液控制单元非接触动态密封条件下硅片的临界运动速度的预测方法。通过实验结果的研究,对浸没液体注入、曝光流场更新、浸没液体回收等区域进行分段处理,结合试验确定节流系数的数值,建立了硅片临界运动速度模型。利用甘油和去离子水按照一定组成配比混合而成的不同黏度液体,试验验证了模型的可靠性。此模型可作为浸液控制单元设计的有益工具,为浸没系统的总体设计提供依据,同时为高折射率、低吸收率的浸没液体的选择提供参考数据。
本论文第五章详细介绍了浸液控制单元样机在流道结构、密封结构、气液混合物回收结构、浸没液体注入方式、以及样机安装镜头夹持等方面进行的改进和优化。说明了浸液控制单元以先功能实现、而后性能优化为主要特点的研发过程,实现了浸没液体全周连续回收口和全周连续气密封结构,完成同合作单位的浸没式光刻试验平台集成和测试。
本论文第六章为结论与展望,说明了论文的主要及进展、本课题的主要创新点、以及课题还需要进一步完善和深入研究的内容。
Immersion lithography seeks to extend the resolution of optical lithography by filling the gap between the final optical element and the wafer with a liquid characterized by a high index of refraction. During the scanning and exposure process, immersion liquid is injected into the space between wafer and lens with certain inlet pressure and angle. Because the liquid will act as a lens component during the lithographic process, it must maintain high uniform optical quality. One source of optical degradation may be due to liquid contamination by chemical products or impurities during exposure period. Immersion liquid renovation is probably the best solution. The semiconductor industry demands high throughput, leading to relatively large wafer scanning velocities and accelerations. For higher scanning velocities, an issue that has been identified is the deposition of the immersion liquid while confining a relatively small amount of liquid to the under-lens region. Liquid loss occurs at the receding contact line that forms when a substrate is withdrawn from a liquid, which potentially leads to defects on printed patterns.
In this dissertation, the liquid dispensing structure and noncontact sealing mechanism of the immersion unit for immersion lithography is systematically investigated, focusing on the mechanism designing, processing, testing, numerical simulation and performance optimization. Also, a pipeline supplying system is designed and optimized, compatible with the immersion unit, preparing for the industrial implementation of immersion lithography manufacturing equipment. Firstly, a numerical model is built to simulate the liquid dispense-flow-collection procedure, based on which, the flow state and the renovating cycle are studied. Secondly, a noncontact sealing mechanism is designed, upon which, a new liquid injection and collection model with analytic solutions is presented and compared with experimental results. Finally, according to the principles obtained, immersion unit prototype and its revised editions are designed and manufactured. After performance testing and optimization, the dynamic sealing ability for immersion unit is proved.
The main contents of this dissertation are briefly stated as the followings:
Study on liquid dispensing structure and flow state within under-lens region. Three-dimensional computational fluid dynamics models are built to simulate the liquid dispense-flow-collection procedure, featuring flow field stream patterns, lens normal and shear pressure, considering fluid injecting velocity, dispense ports quantity, and direction angles. Compared with experimental results, refreshing cycle time and velocity distribution are investigated, presenting theoretical support for system optimization and compatibility
Study on dynamic sealing for the gap flow field boundary. A noncontact sealing method is studied, aiming at avoiding the liquid leaking on wafer motion and the liquid fulfillment beneath the lens. As new liquid injection and collection model with analytic solutions is presented and compared with experimental results, in which the critical velocity for liquid loss is mainly a function of the vacuum degree, the injection flow rate, the properties of the immersion liquid. This correlation allows the critical velocity to be predicted with a given gap height between wafer and lens using only a measurement of the injection speed and knowledge of the fluid properties. This correlation represents a useful tool that can serve to approximately guide the development of fluid control for immersion systems as well as to evaluate alternative immersion fluid candidates to minimize liquid deposition while maximizing throughput.
Study on immersion unit performance testing and pipeline supplying system optimization. Steady-state operating performance for immersion unit prototype is carried out to obtain the designing principles of low-pressure noncontact sealing element. A pipeline supplying system is exploratory designed and built, compatible with the input interface of immersion unit.
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