石墨靶溅射时间对Ta-C涂层性能的影响
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摘要
采用脉冲磁控溅射在YG10硬质合金基体上制备Ta-C(Tetrahedral amorphous carbon)涂层,通过控制石墨靶溅射时间制备得到不同性能的Ta-C涂层,采用扫描显微镜、纳米压痕仪以及拉曼光谱仪分析了Ta-C涂层的表面形貌、硬度以及sp~3与sp~2比例,并选取三个典型参数制备Ta-C涂层铣刀进行干式铣削2A50铝合金实验,验证所选石墨靶溅射时间制备的Ta-C涂层的优劣。结果表明:随着石墨靶溅射时间从40 min到80 min逐渐增加,Ta-C涂层的表面形貌质量、硬度、sp~3含量以及切削性能呈现先上升后下降的趋势,石墨靶溅射时间55 min制备的Ta-C涂层综合性能最好,硬度达到86.9 GPa,sp~3含量较高。石墨靶不同溅射时间制备的Ta-C涂层表面形貌、硬度以及sp~3与sp~2比例有较大差别,选择合适的溅射时间制备Ta-C涂层工件至关重要,本项研究中石墨靶溅射55 min制备的Ta-C涂层综合性能最优,使用寿命最长,切削性能最好。
The work aims to study the effect of sputtering time of graphite target on the properties of Ta-C coating prepared by pulsed magnetron sputtering on cemented carbide(YG10).The SEM,nanoindentation and Raman spectrometer were used to analyze the surface morphology,hardness and ratio of sp~3 to sp~2,then three time points were chosen to deposit Ta-C coating on the milling cutter for dry-type milling of 2A50 aluminum alloy.The advantages and disadvantages of Ta-C coating were observed.The results show with the increase of sputtering time from 40-80 min,the surface morphology,hardness,sp~3 content and cutting performance of Ta-C coating increased first and then decreased.The Ta-C coating prepared by sputtering for 55 min has the best properties:the hardness reached 86.9 GPa and the sp~3 content was relatively high.Thus,the surface morphology,hardness and the ratio of sp~3 to sp~2 of Ta-C coating prepared by graphite target sputtering for different time are quite different.It is very important to select the suitable sputtering time to prepare Ta-C coating.In this study,the Ta-C coating prepared by graphite target sputtering for 55 min has the best performance,the longest service life and the best cutting performance.
The work aims to study the effect of sputtering time of graphite target on the properties of Ta-C coating prepared by pulsed magnetron sputtering on cemented carbide(YG10).The SEM,nanoindentation and Raman spectrometer were used to analyze the surface morphology,hardness and ratio of sp~3 to sp~2,then three time points were chosen to deposit Ta-C coating on the milling cutter for dry-type milling of 2A50 aluminum alloy.The advantages and disadvantages of Ta-C coating were observed.The results show with the increase of sputtering time from 40-80 min,the surface morphology,hardness,sp~3 content and cutting performance of Ta-C coating increased first and then decreased.The Ta-C coating prepared by sputtering for 55 min has the best properties:the hardness reached 86.9 GPa and the sp~3 content was relatively high.Thus,the surface morphology,hardness and the ratio of sp~3 to sp~2 of Ta-C coating prepared by graphite target sputtering for different time are quite different.It is very important to select the suitable sputtering time to prepare Ta-C coating.In this study,the Ta-C coating prepared by graphite target sputtering for 55 min has the best performance,the longest service life and the best cutting performance.
引文
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[22]AHMAD I,MAGUIRE P D,LEMOINE P,et al.Deposition of carbon films onto metal and silicon substrates by filtered cathodic vacuum arc,plasma enhanced CVD and unbalanced magnetron sputtering[J].Diamond&Related Materials,2004,13(4-8):1346-1349.
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[24]董美伶,金国,王海斗,等.纳米压痕法测量残余应力的研究现状[J].材料导报,2014,28(3):107-113.DONG M L,JIN G,WANG H D,et al.Material Guide,2014,28(3):107-113.
[2]KHADEM M,PENKOV O V,PUKHA V E,et al.Ultra-thin nano-patterned wear-protective diamond-like carbon coatings deposited on glass using a C 60,ion beam[J].Carbon,2014,80(1):534-543.
[3]XU J,HANG L,LIU W,et al.Hydrogen-free carbon thin films prepared by unbalanced magnetron sputtering[C]//Proceedings of the International Symposium on Advanced Optical Manufacturing and Testing Technologies,2005:61492S-61492S.
[4]MA G,LIN G,WANG M,et al.Wettability study of different films prepared by magnetron sputtering hybrid deposition on the Ti alloy[J].Rare Metal Materials&Engineering,2013,42:170-173.
[5]ZHANG X,ZHANG H,WU X,et al.Structure and wear resistance of tetrahedral amorphous carbon films[J].Nuclear Instruments&Methods in Physics Research,2003,206(206):215-218.
[6]YEO R J,DWIVEDI N,TRIPATHY S,et al.Excellent wear life of silicon nitride/tetrahedral amorphous carbon bilayer overcoat on functional tape heads[J].Applied Physics Letters,2015,106(9):091604.
[7]XIE J.Synthesis and characterization of amorphous carbon films for magnetic storage technology[D].Dissertations&ThesesGradworks,2015.
[8]YOKOTA T,SAWA T,YOKOUCHI M,et al.Frictional properties of diamond-like carbon coated tool in dry intermittent machining of aluminum alloy 5052[J].Precision Engineering,2014,38(2):365-370.
[9]BEWILOGUA K,HOFMANN D.History of diamondlike carbon films-From first experiments to worldwide applications[J].Surface&Coatings Technology,2014,242(4):214-225.
[10]于翔,张旭,王成彪,等.四面体无定型无氢非晶碳膜的制备及其摩擦学性能研究[J].摩擦学学报,2005,25(2):135-139.YU X,ZHANG X,WANG C B,et al.Journal of Tribology,2005,25(2):135-139.
[11]蔡建,杨巍,代伟,等.基体负偏压对四面体非晶碳膜结构和性能的影响[J].中国表面工程,2011,24(6):62-67.YU X,ZHANG X,WANG C B,et al.Journal of Tribology,2005,25(2):135-139.
[12]KANG M C,TAK H S,JEONG Y K,et al.Properties and tool performance of Ta-C films deposited by double-bend filtered cathodic vacuum arc for micro drilling applications[J].Diamond&Related Materials,2010,19(7):866-869.
[13]纪锡旺.超硬类金刚石涂层的制备及其性能表征[D].华东理工大学,2014.
[14]张婷,何娟,任瑛,等.类金刚石薄膜残余应力的研究进展[J].材料导报,2016,30(1):84-87.ZHANG T,HE J,REN Y,et al.Material Guide,2016,30(1):84-87.
[15]卓国海.类金刚石薄膜的膜/基界面调控及其机械力学性能研究[D].江西理工大学,2015.
[16]苏俊宏,葛锦蔓,徐均琪,等.类金刚石薄膜及其进展[J].应用光学,2015,36(5):799-806.SU J H,GE J M,XU J Q,et al.Applied Optics,2015,36(5):799-806.
[17]张而耕,黄彪,周琼.TaC涂层的研究现状及应用[J].陶瓷学报,2017,38(1):8-12.ZHANG E G,HUANG B,ZHOU Q.Journal of Ceramics,2017,38(1):8-12.
[18]李春伟,苗红涛,徐淑艳,等.复合高功率脉冲磁控溅射技术的研究进展[J].表面技术,2016,45(6):82-90.LI C W,MIAO H T,XU S Y,et al.Surface technology,2016,45(6):82-90.
[19]王启民,张小波,张世宏,等.高功率脉冲磁控溅射技术沉积硬质涂层研究进展[J].广东工业大学学报,2013,(4):1-13.WANG Q M,ZHANG X B,ZHANG S H,et al.Journal of Guangdong University of Technology,2013,(4):1-13.
[20]INABA H,FUJIMAKI S,FURUSAWA K,et al.ECR-plasma parameters and properties of thin DLC films[J].Vacuum,2002,66(3):487-493.
[21]GERETOVSZKY Z,SZ?RéNYI T.Compositional and thickness distribution of carbon nitride films grown by PLD in the target plane[J].Thin Solid Films,2004,s453-s454:172-176.
[22]AHMAD I,MAGUIRE P D,LEMOINE P,et al.Deposition of carbon films onto metal and silicon substrates by filtered cathodic vacuum arc,plasma enhanced CVD and unbalanced magnetron sputtering[J].Diamond&Related Materials,2004,13(4-8):1346-1349.
[23]HOOKS D E,RAMOS K J,MARTINEZ A R.Elasticplastic shock wave profiles in oriented single crystals of cyclotrimethylenetrinitramine(RDX)at 2.25 GPa[J].Journal of Applied Physics,2006,100(2):174-985.
[24]董美伶,金国,王海斗,等.纳米压痕法测量残余应力的研究现状[J].材料导报,2014,28(3):107-113.DONG M L,JIN G,WANG H D,et al.Material Guide,2014,28(3):107-113.
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