用户名: 密码: 验证码:
高精度位移测量系统的硬件在环仿真
详细信息    查看全文 | 推荐本文 |
  • 英文篇名:Hardware-in-the-Loop Simulation of High Precision Displacement Measurement System
  • 作者:张文涛 ; 杜浩 ; 熊显名 ; 谢仁飚 ; 王献英
  • 英文作者:Zhang Wentao;Du Hao;Xiong Xianming;Xie Renbiao;Wang Xianying;Guilin University of Electronic Technology;Shanghai Micro Electronics Equipment (Group)Co.,Ltd.;
  • 关键词:测量 ; 精密测量 ; 二维光栅 ; 硬件在环 ; 光刻机
  • 英文关键词:measurement;;precision position measurement;;two-dimensional grating;;hardware-in-the-loop;;lithography machine
  • 中文刊名:JJZZ
  • 英文刊名:Chinese Journal of Lasers
  • 机构:桂林电子科技大学电子工程与自动化学院;上海微电子装备(集团)股份有限公司;
  • 出版日期:2018-10-29 07:04
  • 出版单位:中国激光
  • 年:2019
  • 期:v.46;No.506
  • 基金:国家科技重大专项(2017ZX02101007-003)
  • 语种:中文;
  • 页:JJZZ201902011
  • 页数:7
  • CN:02
  • ISSN:31-1339/TN
  • 分类号:86-92
摘要
设计了一个基于二维光栅的高精度位置测量系统的硬件在环仿真平台,分析了测量模型在编程过程中产生误差的原因,并使用该仿真平台测试了模型的精度和运算时间。结果表明,当计算频率为20 kHz时,测量模型的编程精度优于0.79 nm,测量机箱引起的误差为8.84×10~(-7) nm。该仿真平台能够有效地检测基于二维光栅的测量模型在编程过程中产生的误差,并测试模型运算时间。
        A hardware-in-the-loop simulation platform for high-precision position measurement system based on two-dimensional grating is designed. The reasons for the error of the measurement model in the programming process are analyzed, and the simulation platform is used to test the accuracy and operation time of the measurement model. The results show that the accuracy of the measurement model is better than 0.79 nm when the calculated frequency is 20 kHz, and the error caused by simulation platform is 8.84×10~(-7) nm. The simulation platform can effectively detect the errors generated by the measurement model based on the two-dimensional grating in the process of program realization, and test the operation time of the model.
引文
[1] Zhou W L. Technology and application of grating interferometer in high precision measurement[J]. Tooling Engineering, 1994, 28(1): 37-42. 周维来. 光栅干涉仪在高精密测量中的技术和应用[J]. 工具技术, 1994, 28(1): 37-42.
    [2] Castenmiller T, van de Mast F, Kort T D, et al. Towards ultimate optical lithography with NXT: 1950i dual stage immersion platform[J]. Proceedings of SPIE, 2010, 7640: 76401N.
    [3] Xia H J. Research on precise 2-D plane grating measurement system and key technology[D]. Hefei: Hefei University of Technology, 2006: 83-100. 夏豪杰. 高精度二维平面光栅测量系统及关键技术研究[D]. 合肥: 合肥工业大学, 2006: 83-100.
    [4] Wu Y F. Design and research on heterodyne planer grating encoder with nanometer resolution[D]. Chengdu: University of Electronic Science and Technology of China,2015: 51-68. 吴亚风. 高精度平面光栅干涉仪的设计与研究[D]. 成都: 电子科技大学, 2015: 51-68.
    [5] Wang L J, Zhang M, Zhu Y, et al. A novel heterodyne grating interferometer system for in-plane and out-of-plane displacement measurement with nanometer resolution[C]. Annual Meeting of the American Society for Precision Engineering, 2014: 173-177.
    [6] Zhu Y, Wang L J, Zhang M, et al. Displacement measuring system for three-degree-of-freedom heterodyne grating interferometer: CN103759657A[P]. 2013-03-20[2018-08-01]. 朱煜, 王磊杰, 张鸣, 等. 一种三自由度外差光栅干涉仪位移测量系统: CN103759657A[P]. 2013-03-20[2018-08-01].
    [7] Wang X Y. Research of high-precision displacement measurement system based on the principle of diffraction and interference[D]. Harbin: Harbin Institute of Technology, 2014: 30-53. 王雪英. 基于衍射干涉原理的高精度光栅位移测量系统研究[D]. 哈尔滨: 哈尔滨工业大学, 2014: 30-53.
    [8] Lu Y C, Zhou C H, Wei C L, et al. Quadruple optically subdivided two-axis heterodyne grating interferometer: CN105203031A[P]. 2015-09-30[2018-06-20]. 卢炎聪, 周常河, 韦春龙, 等. 四倍光学细分的两轴外差光栅干涉仪: CN105203031A[P]. 2015-09-30[2018-06-20].
    [9] Gao J L, Zong M C. Development of symmetrical double-grating interferometric displacement measuring system[J]. Chinese Journal of Lasers, 2016, 43(9): 0904003. 高金磊, 宗明成. 一种对称式双光栅干涉位移测量系统的研制[J]. 中国激光, 2016, 43(9): 0904003.

© 2004-2018 中国地质图书馆版权所有 京ICP备05064691号 京公网安备11010802017129号

地址:北京市海淀区学院路29号 邮编:100083

电话:办公室:(+86 10)66554848;文献借阅、咨询服务、科技查新:66554700