Direct Immersion Annealing of Thin Block Copolymer Films

详细信息    查看全文

• 作者：Arvind Modi ; Sarang M. Bhaway ; Bryan D. Vogt ; Jack F. Douglas ; Abdullah Al-Enizi ; Ahmed Elzatahry ; Ashutosh Sharma ; Alamgir Karim
• 刊名：ACS Applied Materials & Interfaces
• 出版年：2015
• 出版时间：October 7, 2015
• 年：2015
• 卷：7
• 期：39
• 页码：21639-21645
• 全文大小：387K
• ISSN：1944-8252

文摘

We demonstrate ordering of thin block copolymer (BCP) films via direct immersion annealing (DIA) at enhanced rate leading to stable morphologies. The BCP films are immersed in carefully selected mixtures of good and marginal solvents that can impart enhanced polymer mobility, while inhibiting film dissolution. DIA is compatible with roll-to-roll assembly manufacturing and has distinct advantages over conventional thermal annealing and batch processing solvent-vapor annealing methods. We identify three solvent composition-dependent BCP film ordering regimes in DIA for the weakly interacting polystyrene鈥損oly(methyl methacrylate) (PS鈥揚MMA) system: rapid short-range order, optimal long-range order, and a film instability regime. Kinetic studies in the 鈥渙ptimal long-range order鈥?processing regime as a function of temperature indicate a significant reduction of activation energy for BCP grain growth compared to oven annealing at conventional temperatures. An attractive feature of DIA is its robustness to ordering other BCP (e.g. PS-P2VP) and PS-PMMA systems exhibiting spherical, lamellar and cylindrical ordering.