ArF浸没光刻双工件台运动模型研究
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摘要
作为微电子产业的核心设备，光刻机在摩尔定律的推动下经历了接近、接触式光刻机，步进重复投影光刻机，步进扫描投影光刻机的发展历程，现已进入ArF浸没式双工件台光刻机时代。在大规模工业生产中，要求光刻机能长时间、稳定地进行高速、高精度的曝光运动，故对其整机综合性能提出了苛刻的要求。基于此，本论文对ArF浸没式双工件台光刻机中的步进扫描运动模型、焦面控制运动模型、浸没光刻技术等关键单元技术进行研究，以期为光刻机整机性能的提升及我国ArF浸没式双工件台光刻机的发展打下坚实的理论基础。
论文简介了光刻技术发展的最新动态并详述了主流的ArF浸没式双工件台光刻机发展现状，在此基础上确立本论文的研究对象。对ArF浸没式双工件台光刻机中步进扫描运动模型进行研究：在简述双工件台光刻机步进扫描运动机理的基础上，研究了其运动坐标系、运动中的坐标变换、步进扫描运动数学模型并对其运动轨迹进行了轨迹规划，最后对同步扫描运动进行了实验验证；对ArF浸没式双工件台光刻机中焦面控制运动模型进行研究：论述了焦面控制技术中硅片三维形貌生成、硅片表面曲面拟合、曝光狭缝离焦量计算、调平调焦解耦算法、调平调焦运动控制算法整个流程并进行了仿真分析；对其浸没光刻技术进行研究：在介绍了浸没光刻技术优势的基础上，着重对浸没光刻中的浸液密封性、气泡夹带、流场均一性等问题进行了理论分析并开展了相关仿真分析及实验研究；最后，对论文研究内容进行了总结，指出了本研究现有不足及下一步研究方向。
As the core equipment for the microelectronics industry, the lithographic system drivenby Moore's Law has experienced the history of close contact lithographic system,stepper, scanner, now it is entering the era of ArF immersion dual-stage lithographicsystem. In industrial production, a long time, stable, high-speed, and high-precisionexposure movement is needed, so it is the harsh demands of the overall performance ofthe lithographic system. Based on this, the cell technology for the step-and-scan motionmodel, focal control movement model and immersion lithography in ArF immersiondual-stage lithographic system was researched to upgrade the performance forlithography. It is hoped that a solid theoretical foundation would be established for ourArF immersion dual-stage lithographic system.
The latest development trend in lithographic system and the detail of the ArF immersiondual-stage lithographic system was introduced in the beginning, and the research objectof this paper was fixed based on these. The step-and-scan motion model in ArFimmersion dual-stage lithographic system was studied: on the basis of the step-and-scanmotion mechanism, the coordinate system, the coordinate transformation, themathematical model for step-and-scan motion and the trace trajectory planning for itsmovement was studied carefully, and the experimental verification of synchronizedscanning movement was carried out. The control of the focal plane in ArF immersiondual-stage lithographic system was studied: the entire process of wafer map, surfacefitting of the wafer, defocus amount in exposure slit, decoupling algorithm for focusingand leveling, and the motion control algorithm for focusing and leveling was introducedand simulated lately. the immersion lithography was researched: based on the advantageof immersion lithography, the immersion sealing, the bubbles entrained in flow field andthe uniformity in flow field were focused on, also the theoretical analysis andsimulation analysis was carry out for them. Some related experimental was carried outsimultaneously. Finally, it was a summary for the paper, and the limitation and futureimprovement was pointed out.
论文简介了光刻技术发展的最新动态并详述了主流的ArF浸没式双工件台光刻机发展现状，在此基础上确立本论文的研究对象。对ArF浸没式双工件台光刻机中步进扫描运动模型进行研究：在简述双工件台光刻机步进扫描运动机理的基础上，研究了其运动坐标系、运动中的坐标变换、步进扫描运动数学模型并对其运动轨迹进行了轨迹规划，最后对同步扫描运动进行了实验验证；对ArF浸没式双工件台光刻机中焦面控制运动模型进行研究：论述了焦面控制技术中硅片三维形貌生成、硅片表面曲面拟合、曝光狭缝离焦量计算、调平调焦解耦算法、调平调焦运动控制算法整个流程并进行了仿真分析；对其浸没光刻技术进行研究：在介绍了浸没光刻技术优势的基础上，着重对浸没光刻中的浸液密封性、气泡夹带、流场均一性等问题进行了理论分析并开展了相关仿真分析及实验研究；最后，对论文研究内容进行了总结，指出了本研究现有不足及下一步研究方向。
As the core equipment for the microelectronics industry, the lithographic system drivenby Moore's Law has experienced the history of close contact lithographic system,stepper, scanner, now it is entering the era of ArF immersion dual-stage lithographicsystem. In industrial production, a long time, stable, high-speed, and high-precisionexposure movement is needed, so it is the harsh demands of the overall performance ofthe lithographic system. Based on this, the cell technology for the step-and-scan motionmodel, focal control movement model and immersion lithography in ArF immersiondual-stage lithographic system was researched to upgrade the performance forlithography. It is hoped that a solid theoretical foundation would be established for ourArF immersion dual-stage lithographic system.
The latest development trend in lithographic system and the detail of the ArF immersiondual-stage lithographic system was introduced in the beginning, and the research objectof this paper was fixed based on these. The step-and-scan motion model in ArFimmersion dual-stage lithographic system was studied: on the basis of the step-and-scanmotion mechanism, the coordinate system, the coordinate transformation, themathematical model for step-and-scan motion and the trace trajectory planning for itsmovement was studied carefully, and the experimental verification of synchronizedscanning movement was carried out. The control of the focal plane in ArF immersiondual-stage lithographic system was studied: the entire process of wafer map, surfacefitting of the wafer, defocus amount in exposure slit, decoupling algorithm for focusingand leveling, and the motion control algorithm for focusing and leveling was introducedand simulated lately. the immersion lithography was researched: based on the advantageof immersion lithography, the immersion sealing, the bubbles entrained in flow field andthe uniformity in flow field were focused on, also the theoretical analysis andsimulation analysis was carry out for them. Some related experimental was carried outsimultaneously. Finally, it was a summary for the paper, and the limitation and futureimprovement was pointed out.
引文
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