Linnik偏振白光干涉微纳测量的关键技术研究
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摘要
随着机械、电子、光学、材料和半导体等工业不断地微型化、精密化的需求,开发的微纳米结构的三维形貌、表面膜厚、内部结构以及物理性质等特性对微纳米结构的研发和生产质量控制至关重要。因此,针对微纳米制造领域的三维非接触式测量系统及其技术的研究具有重要的学术价值和现实意义。
本文提出并搭建了一种基于Linnik型偏振白光干涉架构的三维非接触式测量实验系统,并对其关键技术进行了研究,主要包括显微镜光学自动对焦技术、Linnik型白光干涉条纹自动搜索技术、微观表面三维形貌重构及系统标定技术、透明膜厚三维重构技术、材料内部应力双折射分布测量技术和光学三维断层显微测量技术。该系统架构在传统的Linnik干涉架构基础上进行了改动和扩充,可以针对不同的技术功能,切换到相应的模式中,且不必对该测量架构进行任何的改装和拆卸,从而使系统具备了很高的灵活性和稳定性。
本研究的主要工作内容和创新点如下：
1.在Linnik干涉架构中集成一个基于改进的像散法的光学自动对焦系统,以保证显微镜对焦过程中正确对焦位置的唯一性,实现了Linnik结构两个干涉臂的快速自动对焦。自动对焦系统具有190(±95)μm的动态范围,线性段的平均灵敏度为70mV/μm,平均标准偏差为41.6nm,理论分辨率4.4nm,实际测量精度55nm,自动对焦时间不大于0.3秒。
2.在两个干涉臂实现快速自动对焦的前提下,提出一种通过调整干涉臂的光程差来实现干涉条纹自动搜索的策略,实现了对比度最好的干涉条纹的自动搜索,自动搜索速度为2.2min/mm,搜索到的最佳干涉条纹对比度的位置偏离理想位置不超过一个干涉条纹周期。
3.利用频域分析法实现微纳米结构的表面三维形貌重构,并通过系统标定得到了测量标准不确定度±3.6nm、纵向(Z方向)的测量精度误差3.08%、横向X方向的测量精度误差2.69%、横向Y方向的测量精度误差2.16%、横向实际分辨率为1.31μm、纵向理论分辨率为0.59nm。
4.通过对傅立叶相位和振幅这两种方法进行测量灵敏度分析的结果,提出了傅立叶相位和振幅加权的透明膜厚测量技术,该技术结合了傅立叶相位的高分辨率和傅立叶振幅的高重复性的两个优点。测量结果的纵向分辨率达到纳米级,由于采用显微测量技术,其横向分辨率就等于显微物镜的分辨率。
5.利用Linnik白光干涉架构结合偏振测量原理,通过对Berek补偿器的标定,实现了对材料内部应力双折射的相位延迟分布、主轴方向分布、应力分布和反射率分布的同时测量。测量结果的相位延迟标准偏差不大于4°,主轴方向标准偏差不大于4.5°。
6.提出了用于光学相干断层显微测量的具有高计算效率和极小残余寄生条纹量的五点差分格式移相算法,有效地重构出了样本的三维断层显微图像。并对包括探测器非线性和PZT移相器对波长依赖性在内的两个主要系统误差及其改进方法进行了分析。
7.针对前述的PZT移相器对波长具有依赖性的问题,提出了移相量八倍于半波片旋转角的消色差几何移相干涉技术及系统,其具备了目前最大的几何移相放大倍率和最好的消色差性。该部分为本文的扩展研究内容。
With the demand for the continuously miniaturization and precision of machinery, electronics, optics, material and semiconductor industries, three-dimensional topography, thin-film thickness, internal structure and physical property play an essential role in the research, production and quality control of the developed micro-/nano-stuctures. Therefore, the study of the three-dimensional non-contact measurement system and techniques for the field of the micro-/nano-manufacturing has significant academic value and practical meaning.
In this paper, a three-dimensional non-contact measurement system based on the Linnik polarization-sensitive white light interferometry (PSWLI) configuration is proposed and established, and its key techniques are studied. The techniques include the optical autofocus of microscopic system, the automatic search of Linnik white light interferogram, the three-dimensional surface topography and system calibration, the three-dimensional topography of thin-film thickness, the internal stress induced birefringence measurement and the three-dimensional optical coherence microscopy. The overall system configuration, which is modified and expanded based on the traditional Linnik interference configuration, can switch to the appropriate mode according to the different techniques and does not have to disassemble and remove any part of it. Thereby, the developed system has a high flexibility and stability.
The main work and the innovation of this thesis are concluded as follows:
1. An improved astigmatic autofocus system is embedded in the Linnik PSWLI to make the unique identification of the best focus position of the microscope and thus realizes the fast autofocus of the two interference arms of the Linnik PSWLI. The developed autofocus system has a dynamic range of190(±95) μm, average sensitivity of70mV/μm, average standard deviation of41.6nm, displayed resolution of4.4nm, accuracy of55nm, and autofocus time less than0.3s.
2. An automatic search stratege of Linnik white light interferogram of the best fringe contrast by adjusting the optical path difference is proposed under the circumstance that the two interference arms are auto-focused. The automatic search time is2.2min/mm, and the best fringe contrast position obtained by the proposed method does not deviate the ideal one from one cycle of the interference signal at most.
3. The three-dimensional surface topography of the mico-/nano-structure is realized by the frequency domain analysis of the interference signal. In accordance with the results of the calibration experiment, the system has a measurement standard uncertainty of±3.6nm, error of the axial measurement accuracy of3.08%, error of the lateral X-direction measurement accuracy of2.69%, error of the lateral Y-direction measurement accuracy of2.16%, practical lateral resolution of1.31 μm and theoretical axial resolution of0.59nm.
4. The weighted method of Fourier phase and amplitude for the thin-film thickness measurement is proposed according to the sensitivity analysis. The weighted method combines the advantages of the Fourier phase of high resolution and the Fourier amplitude of high repeatability. The axial resolution of the measurement result achieves nanometer, and the lateral resolution equals to that of the microscope objective.
5. Linnik white light interferometer configuration combined with polarization-sensitive detection is used to simultaneously measure the phase retardation distribution, the optical axis orientation, the stress distribution and the reflectance distribution of the internal stress induced birefringence sample. The standard deviations of the phase retardation and the optical axis orientation are less than4°and4.5°, respectively, according to the calibration results of the Berek compensator.
6. A five-point-stencil (FPS) based phase shifting algorithm, which has high computation efficiency and small parasitic fringe amount, is proposed to effectively measure the optical coherence microscopic image of a sample. The two major systematic errors, detector nonlinearity and dependence of the PZT phase shifter on the wavelength, are analyzed and the improved methods are discussed.
7. An achromatic (geometric) phase shifting interference system and technology are proposed to tackle the aforementioned problem of the dependence of the PZT phase shifter on the wavelength. The developed geometric phase shifter configuration, by which the shifted phase is eight times the rotation angle of the half-wave plate, has the largest magnification of the phase shifting and the best achromatism. This part is the extension of the study.
本文提出并搭建了一种基于Linnik型偏振白光干涉架构的三维非接触式测量实验系统,并对其关键技术进行了研究,主要包括显微镜光学自动对焦技术、Linnik型白光干涉条纹自动搜索技术、微观表面三维形貌重构及系统标定技术、透明膜厚三维重构技术、材料内部应力双折射分布测量技术和光学三维断层显微测量技术。该系统架构在传统的Linnik干涉架构基础上进行了改动和扩充,可以针对不同的技术功能,切换到相应的模式中,且不必对该测量架构进行任何的改装和拆卸,从而使系统具备了很高的灵活性和稳定性。
本研究的主要工作内容和创新点如下：
1.在Linnik干涉架构中集成一个基于改进的像散法的光学自动对焦系统,以保证显微镜对焦过程中正确对焦位置的唯一性,实现了Linnik结构两个干涉臂的快速自动对焦。自动对焦系统具有190(±95)μm的动态范围,线性段的平均灵敏度为70mV/μm,平均标准偏差为41.6nm,理论分辨率4.4nm,实际测量精度55nm,自动对焦时间不大于0.3秒。
2.在两个干涉臂实现快速自动对焦的前提下,提出一种通过调整干涉臂的光程差来实现干涉条纹自动搜索的策略,实现了对比度最好的干涉条纹的自动搜索,自动搜索速度为2.2min/mm,搜索到的最佳干涉条纹对比度的位置偏离理想位置不超过一个干涉条纹周期。
3.利用频域分析法实现微纳米结构的表面三维形貌重构,并通过系统标定得到了测量标准不确定度±3.6nm、纵向(Z方向)的测量精度误差3.08%、横向X方向的测量精度误差2.69%、横向Y方向的测量精度误差2.16%、横向实际分辨率为1.31μm、纵向理论分辨率为0.59nm。
4.通过对傅立叶相位和振幅这两种方法进行测量灵敏度分析的结果,提出了傅立叶相位和振幅加权的透明膜厚测量技术,该技术结合了傅立叶相位的高分辨率和傅立叶振幅的高重复性的两个优点。测量结果的纵向分辨率达到纳米级,由于采用显微测量技术,其横向分辨率就等于显微物镜的分辨率。
5.利用Linnik白光干涉架构结合偏振测量原理,通过对Berek补偿器的标定,实现了对材料内部应力双折射的相位延迟分布、主轴方向分布、应力分布和反射率分布的同时测量。测量结果的相位延迟标准偏差不大于4°,主轴方向标准偏差不大于4.5°。
6.提出了用于光学相干断层显微测量的具有高计算效率和极小残余寄生条纹量的五点差分格式移相算法,有效地重构出了样本的三维断层显微图像。并对包括探测器非线性和PZT移相器对波长依赖性在内的两个主要系统误差及其改进方法进行了分析。
7.针对前述的PZT移相器对波长具有依赖性的问题,提出了移相量八倍于半波片旋转角的消色差几何移相干涉技术及系统,其具备了目前最大的几何移相放大倍率和最好的消色差性。该部分为本文的扩展研究内容。
With the demand for the continuously miniaturization and precision of machinery, electronics, optics, material and semiconductor industries, three-dimensional topography, thin-film thickness, internal structure and physical property play an essential role in the research, production and quality control of the developed micro-/nano-stuctures. Therefore, the study of the three-dimensional non-contact measurement system and techniques for the field of the micro-/nano-manufacturing has significant academic value and practical meaning.
In this paper, a three-dimensional non-contact measurement system based on the Linnik polarization-sensitive white light interferometry (PSWLI) configuration is proposed and established, and its key techniques are studied. The techniques include the optical autofocus of microscopic system, the automatic search of Linnik white light interferogram, the three-dimensional surface topography and system calibration, the three-dimensional topography of thin-film thickness, the internal stress induced birefringence measurement and the three-dimensional optical coherence microscopy. The overall system configuration, which is modified and expanded based on the traditional Linnik interference configuration, can switch to the appropriate mode according to the different techniques and does not have to disassemble and remove any part of it. Thereby, the developed system has a high flexibility and stability.
The main work and the innovation of this thesis are concluded as follows:
1. An improved astigmatic autofocus system is embedded in the Linnik PSWLI to make the unique identification of the best focus position of the microscope and thus realizes the fast autofocus of the two interference arms of the Linnik PSWLI. The developed autofocus system has a dynamic range of190(±95) μm, average sensitivity of70mV/μm, average standard deviation of41.6nm, displayed resolution of4.4nm, accuracy of55nm, and autofocus time less than0.3s.
2. An automatic search stratege of Linnik white light interferogram of the best fringe contrast by adjusting the optical path difference is proposed under the circumstance that the two interference arms are auto-focused. The automatic search time is2.2min/mm, and the best fringe contrast position obtained by the proposed method does not deviate the ideal one from one cycle of the interference signal at most.
3. The three-dimensional surface topography of the mico-/nano-structure is realized by the frequency domain analysis of the interference signal. In accordance with the results of the calibration experiment, the system has a measurement standard uncertainty of±3.6nm, error of the axial measurement accuracy of3.08%, error of the lateral X-direction measurement accuracy of2.69%, error of the lateral Y-direction measurement accuracy of2.16%, practical lateral resolution of1.31 μm and theoretical axial resolution of0.59nm.
4. The weighted method of Fourier phase and amplitude for the thin-film thickness measurement is proposed according to the sensitivity analysis. The weighted method combines the advantages of the Fourier phase of high resolution and the Fourier amplitude of high repeatability. The axial resolution of the measurement result achieves nanometer, and the lateral resolution equals to that of the microscope objective.
5. Linnik white light interferometer configuration combined with polarization-sensitive detection is used to simultaneously measure the phase retardation distribution, the optical axis orientation, the stress distribution and the reflectance distribution of the internal stress induced birefringence sample. The standard deviations of the phase retardation and the optical axis orientation are less than4°and4.5°, respectively, according to the calibration results of the Berek compensator.
6. A five-point-stencil (FPS) based phase shifting algorithm, which has high computation efficiency and small parasitic fringe amount, is proposed to effectively measure the optical coherence microscopic image of a sample. The two major systematic errors, detector nonlinearity and dependence of the PZT phase shifter on the wavelength, are analyzed and the improved methods are discussed.
7. An achromatic (geometric) phase shifting interference system and technology are proposed to tackle the aforementioned problem of the dependence of the PZT phase shifter on the wavelength. The developed geometric phase shifter configuration, by which the shifted phase is eight times the rotation angle of the half-wave plate, has the largest magnification of the phase shifting and the best achromatism. This part is the extension of the study.
引文
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