银基电磁屏蔽镀膜玻璃
摘要
随着电子技术的发展，电子设备的广泛应用，电磁辐射对人们生活的影响日益增加。电磁干扰的危害主要有两个方面：(1)导致电子设备产生噪音甚至是故障；(2)危害人类的身体健康。因此，屏蔽电磁辐射显得非常重要。很多电磁屏蔽材料被用来防止电磁辐射的干扰。在很多领域如高灵敏的医疗诊断设备、个人电子设备的显示屏、航天飞行器的窗户，要求材料既具有电磁屏蔽功能，又具有较高的可见光透射率。透明电磁屏蔽玻璃很好的符合了这些要求。本文的创新点：用磁控溅射的方法在室温下在载玻片衬底上制备了AZO／Ag／AZO三层膜和AZO／Ag／AZO／Ag／AZO五层膜，基于电磁屏蔽多层膜的光学薄膜设计矩阵法理论，对多层膜系进行设计计算，确定各层膜材料及膜厚的基本参数，为实验提供了理论依据，使镀膜玻璃具有高的可见光透射率和高的电磁屏蔽效能，研究了Ag纳米薄膜在室温大气条件下的氧化过程和机理。
本文得出的主要结论如下：
1)对于AZO／Ag／AZO三层膜系，当银膜的厚度为16nm，AZO膜的厚度为45nm时，膜系有最佳的光电、电磁性能，方块电阻为5．02Ω/sq，最大可见光透射率为86％，红外反射率为95％，电磁屏蔽效能为35dB(5．85-8．2GHz)。
2)对于AZO／Ag／AZO／Ag／AZO五层膜系，当银膜的厚度为16nm，AZO膜的厚度为92nm时，膜系有最佳的光电、电磁性能，方块电阻为2．73Ω／sq，最大可见光透射率为70％，红外反射率为99％，电磁屏蔽效能为40dB(5．85-8．2GHz)。
3)Ag纳米薄膜暴露在室温大气环境中会被逐渐氧化，光学和电学性能都发生了很大的变化，失去了良好的导电性能和对红外的高反射性能。Ag_2S和Ag_2SO_4先是点状分布在Ag膜表面，等Ag膜完全氧化后，形成连续致密的Ag_2S(含少量的Ag_2SO_4)薄膜。Ag纳米薄膜暴露在室温大气环境中氧化时，O_2开始只是化学吸附在薄膜表面，引起表面重构，没有Ag_2O生成。然后含S的小分子气体(如：H_2S，SO_2)也化学吸附在薄膜表面，引起表面重构。最后Ag纳米薄膜在O_2和这些含S的小分子气体的作用下被大量氧化成圆锥形柱状的Ag_2S和少量Ag_2SO_4颗粒。大气中的CO_2和N_2不会与Ag纳米薄膜反应。
With the development of electronic technology and broad application ofelectronic equipment, electromagnetic radiation has an increasing significant impacton the human life. The electromagnetic interference could cause two problems: (1)noise signal and even malfunction of the electronic appliance; (2) radiative damageof the human body. Therefor shielding of electromagnetic radiation is very important.Many electromagnetic shielding materials are used to prevent electromagneticinterference. In many fields such as medical instrument for diagnosis, display screenof personal electronic equipment, windows of aerospacecraft, request the materialswith large shielding effectiveness and high transparency in the visible range.Transparent electromagnetic shielding glasses accord with these requests. Theinnovations in this article are that AZO/Ag/AZO and AZO/Ag/AZO/Ag/AZOmultilayer films are produced by magnetic sputtering at room temperature; throughexperiments and theory calculation, the structure of the multilayer films is fixed whatmake sure the glass has high transparency in the visible range and large shieldingelectromagnetic effectiveness; Oxidizing processes and mechanism of silver thinfilm in atmosphere at room temperature are researched.
The main obtained conclusions in this article are as follows:
1) For AZO/Ag/AZO multilayer films, when the thickness of silver film andAZO film is 16nm and 45nm respectively, multilayer films show minimum sheetresistance of 5.02Ω/sq, maximum transmittance in the visible of 86%, maximuminfrared reflectivity of 95% and electromagnetic shielding effectiveness of35dB(5.85-8.2GHz).
2)For AZO/Ag/AZO/Ag/AZO multilayer films, when the thickness of silver filmand AZO film is 16nm and 92nm respectively, multilayer films show minimumsheet resistance of 2.73Ω/sq, maximum transmittance in the visible of 70%,maximum infrared reflectivity of 99% and electromagnetic shielding effectiveness of40dB (5.85-8.2GHz).
3) The silver thin film with thickness of about 16nm deposited by radiofrequency magnetron sputtering will be degraded in atmospheric environment at room temperature and lose good conductivity and high infrared reflectivity. Ag_2Sand Ag_2SO_4 first dot-dispersed over silver film, and then formed continuum compactAg_2S (little Ag_2SO_4) film after the silver film tally oxidized. The mechanism ofoxidation of silver thin film exposed to the room temperature and atmosphericenvironment is as the following: O_2 was first chemically adsorbed on the surface ofthe films and the surface reconstruction was caused; then small molecule gasescontaining S such as H_2S and SO_2 were also chemically adsorbed on the surface ofthe films and the surface reconstruction was caused again; finally, the silver thinfilms were oxidized to a great deal of columnar Ag_2S and a few of Ag_2SO_4 by O_2and small molecule gases containing S; the silver thin films were not oxidized byCO_2 and N_2 in the air.
本文得出的主要结论如下：
1)对于AZO／Ag／AZO三层膜系，当银膜的厚度为16nm，AZO膜的厚度为45nm时，膜系有最佳的光电、电磁性能，方块电阻为5．02Ω/sq，最大可见光透射率为86％，红外反射率为95％，电磁屏蔽效能为35dB(5．85-8．2GHz)。
2)对于AZO／Ag／AZO／Ag／AZO五层膜系，当银膜的厚度为16nm，AZO膜的厚度为92nm时，膜系有最佳的光电、电磁性能，方块电阻为2．73Ω／sq，最大可见光透射率为70％，红外反射率为99％，电磁屏蔽效能为40dB(5．85-8．2GHz)。
3)Ag纳米薄膜暴露在室温大气环境中会被逐渐氧化，光学和电学性能都发生了很大的变化，失去了良好的导电性能和对红外的高反射性能。Ag_2S和Ag_2SO_4先是点状分布在Ag膜表面，等Ag膜完全氧化后，形成连续致密的Ag_2S(含少量的Ag_2SO_4)薄膜。Ag纳米薄膜暴露在室温大气环境中氧化时，O_2开始只是化学吸附在薄膜表面，引起表面重构，没有Ag_2O生成。然后含S的小分子气体(如：H_2S，SO_2)也化学吸附在薄膜表面，引起表面重构。最后Ag纳米薄膜在O_2和这些含S的小分子气体的作用下被大量氧化成圆锥形柱状的Ag_2S和少量Ag_2SO_4颗粒。大气中的CO_2和N_2不会与Ag纳米薄膜反应。
With the development of electronic technology and broad application ofelectronic equipment, electromagnetic radiation has an increasing significant impacton the human life. The electromagnetic interference could cause two problems: (1)noise signal and even malfunction of the electronic appliance; (2) radiative damageof the human body. Therefor shielding of electromagnetic radiation is very important.Many electromagnetic shielding materials are used to prevent electromagneticinterference. In many fields such as medical instrument for diagnosis, display screenof personal electronic equipment, windows of aerospacecraft, request the materialswith large shielding effectiveness and high transparency in the visible range.Transparent electromagnetic shielding glasses accord with these requests. Theinnovations in this article are that AZO/Ag/AZO and AZO/Ag/AZO/Ag/AZOmultilayer films are produced by magnetic sputtering at room temperature; throughexperiments and theory calculation, the structure of the multilayer films is fixed whatmake sure the glass has high transparency in the visible range and large shieldingelectromagnetic effectiveness; Oxidizing processes and mechanism of silver thinfilm in atmosphere at room temperature are researched.
The main obtained conclusions in this article are as follows:
1) For AZO/Ag/AZO multilayer films, when the thickness of silver film andAZO film is 16nm and 45nm respectively, multilayer films show minimum sheetresistance of 5.02Ω/sq, maximum transmittance in the visible of 86%, maximuminfrared reflectivity of 95% and electromagnetic shielding effectiveness of35dB(5.85-8.2GHz).
2)For AZO/Ag/AZO/Ag/AZO multilayer films, when the thickness of silver filmand AZO film is 16nm and 92nm respectively, multilayer films show minimumsheet resistance of 2.73Ω/sq, maximum transmittance in the visible of 70%,maximum infrared reflectivity of 99% and electromagnetic shielding effectiveness of40dB (5.85-8.2GHz).
3) The silver thin film with thickness of about 16nm deposited by radiofrequency magnetron sputtering will be degraded in atmospheric environment at room temperature and lose good conductivity and high infrared reflectivity. Ag_2Sand Ag_2SO_4 first dot-dispersed over silver film, and then formed continuum compactAg_2S (little Ag_2SO_4) film after the silver film tally oxidized. The mechanism ofoxidation of silver thin film exposed to the room temperature and atmosphericenvironment is as the following: O_2 was first chemically adsorbed on the surface ofthe films and the surface reconstruction was caused; then small molecule gasescontaining S such as H_2S and SO_2 were also chemically adsorbed on the surface ofthe films and the surface reconstruction was caused again; finally, the silver thinfilms were oxidized to a great deal of columnar Ag_2S and a few of Ag_2SO_4 by O_2and small molecule gases containing S; the silver thin films were not oxidized byCO_2 and N_2 in the air.
引文
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[7] E.Ando,M.Miyazaki.Moisture resistance of the low-emissivity coatings with a layerstructure of Al-doped ZnO/Ag/Al-doped ZnO.Thin Solid Films,2001,392:289-293
[8] Z.G.Wang,X.Cai,Q.L.Chen,et al.Effects of Ti transition layer on stability ofsilver/titanium dioxide multilayered structure.Thin Solid films,2007,515:3146-3150
[9] 王炜，龚健，杨怀京．电磁屏蔽与电磁屏蔽玻璃．中国建材科技，2001，04：71-72
[10] 姜勇，王刚．电磁屏蔽玻璃在电磁屏蔽方舱上的应用．安全与电磁兼容，2005，01：37-39
[11] 吴玉韬，翁小龙，邓龙江．低温沉积ITO膜的透光率及电磁屏蔽特性的研究．真空科学与技术学报，2006，26(5)：372-376
[12] 李秀荣，刘静，李长珍．高频电磁屏蔽用ITO膜结构与性能分析．武汉工业大学学报，2000，22(6)：21-24
[13] 王炜，龚健，杨怀京．高性能电加热电磁屏蔽玻璃的研制．中国建材科技，2005，03：30-32
[14] 张维佳，岳锡华，王宝发等．飞机座舱复合玻璃电磁性能和透光性能研究．航空学报，1995，16(5)：574-580
[15] 张维佳，岳锡华，范学涛等．飞机座舱风档复合玻璃结构优化设计．北京航空航天大学学报，1997，23(2)：141-146
[16] SAMUEL Y.LIAO.RF Shielding Effectiveness and Light Transmission of Copper orSilver Film Coating on Plastic Substrate.IEEE TRANSACTIONS ONELECTROMAGNETIC COMPATIBILITY,VOL.EMC-18,NO.4,NOVEMBER1976,148-153
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