热伏系统中光谱控制器的工艺技术研究
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摘要
热光伏电池的设想是在20世纪60年代提出的,但由于当时科研水平的限制直到90年代中期才有较大的进展。热光伏系统由热辐射器、光谱控制器、热光伏电池组件、热回收器和辅助组件组成。光谱控制器也即光学滤波器,用来实现热辐射与热光伏电池之间的光学匹配,主要作用是透过所需波段红外光,并将热光伏电池不能转换成电能的红外光反射回热辐射器重新利用。光谱控制器直接影响到热光伏系统的转换效率,因此对其工艺技术进行研究就显得尤为重要。本文主要研究光谱控制器的工艺技术,即镀制光谱控制器表面增透膜系的工艺技术研究。
本文以薄膜成核生长和真空镀膜理论知识为基础确定本课题的增透膜镀制方法:电子束蒸镀。在确定了采用电子束蒸镀后,分析了影响Si、SiO_2、TiO_2这三种薄膜生长和结构的主要工艺参数:基片温度、真空度和沉积速率,通过试验进一步确定了这三个工艺参数对薄膜性能和结构的影响,最终给出了制备光谱控制器的膜系的工艺参数以及工艺流程。
The idea of photovoltaic cells in the 1960s, but since then the level of scientific research restrictions until the mid-1990s have greater progress. Heat photovoltaic system from thermal radiation, spectrum controller, components of photovoltaic cells, heat recovery and the secondary component composition. Spectrum controller that is optical filter, used to achieve thermal radiation and thermal photovoltaic cells between the optical match, needed a major role through the band infrared light and heat photovoltaic cells can not be converted into electrical energy infrared Light reflection back for re-use of thermal radiation. Controllers direct impact on the spectrum of photovoltaic conversion efficiency of the system, so its research on the technology it is particularly important. This paper on the spectrum controller technology, that is, the surface coating spectrum controller antireflective coating technology research.
In this paper, film and into the vacuum coating of theoretical knowledge of the issues identified based on the antireflective film coating method: electron beam evaporation. In determining the use of electron beam evaporation, the analysis of the impact of Si, SiO_2, TiO_2 these three films growth and structure of the main parameters: the substrate temperature, vacuum and deposition rate, determined through further testing of these three parameters The film performance and structure of the end of the spectrum is the controller of the membrane technology parameters and processes.
本文以薄膜成核生长和真空镀膜理论知识为基础确定本课题的增透膜镀制方法:电子束蒸镀。在确定了采用电子束蒸镀后,分析了影响Si、SiO_2、TiO_2这三种薄膜生长和结构的主要工艺参数:基片温度、真空度和沉积速率,通过试验进一步确定了这三个工艺参数对薄膜性能和结构的影响,最终给出了制备光谱控制器的膜系的工艺参数以及工艺流程。
The idea of photovoltaic cells in the 1960s, but since then the level of scientific research restrictions until the mid-1990s have greater progress. Heat photovoltaic system from thermal radiation, spectrum controller, components of photovoltaic cells, heat recovery and the secondary component composition. Spectrum controller that is optical filter, used to achieve thermal radiation and thermal photovoltaic cells between the optical match, needed a major role through the band infrared light and heat photovoltaic cells can not be converted into electrical energy infrared Light reflection back for re-use of thermal radiation. Controllers direct impact on the spectrum of photovoltaic conversion efficiency of the system, so its research on the technology it is particularly important. This paper on the spectrum controller technology, that is, the surface coating spectrum controller antireflective coating technology research.
In this paper, film and into the vacuum coating of theoretical knowledge of the issues identified based on the antireflective film coating method: electron beam evaporation. In determining the use of electron beam evaporation, the analysis of the impact of Si, SiO_2, TiO_2 these three films growth and structure of the main parameters: the substrate temperature, vacuum and deposition rate, determined through further testing of these three parameters The film performance and structure of the end of the spectrum is the controller of the membrane technology parameters and processes.
引文
[1]肖志斌.热光伏电池简介.第二十四界中国化学与物理电源学术年会论文集.2005,385-386
[2]乔在祥,文浚.热光伏技术的研究进展.电源技术.2005(29):57-61
[3]陈雪,宣益民.热光伏技术基本原理与研究进展.半导体光电.2006,27(8):353-368
[4]林永昌,卢维强.光学薄膜原理.北京:国防工业出版社,1990
[5]唐晋发,顾培夫.薄膜光学与技术.北京:机械工业出版社,1987
[6]尹树百.薄膜光学--理论与实践.北京:科学出版社,1987
[7]唐伟忠.薄膜材料制备原理、技术及应用.北京:冶金工业出版社,1998
[8]张荣军,郑玉祥等.光学滤波片薄膜镀制工艺中的监控技术模拟分析.红外与毫米波学报.2003(22):56-58
[9]严一心,林鸿海.薄膜技术.北京:兵器工业出版社,1994
[10]田明波,刘德令.薄膜科学与技术手册.北京:机械工业出版社,1991
[11]王力衡等.薄膜技术.北京:清华大学出版社,1991
[12]麻莳立男(日).薄膜技术基础.北京:电子工业出版社,1996
[13]赵妙,周代兵等.双源电子束蒸发制备Si/SiO_2光学薄膜的工艺.半导体学报.2006(27):1586-1589
[14]郭屏.荷能离子束沉积的氧化物薄膜光学性质.光学仪器.1999(21):56-61
[15]陈国平主编.薄膜物理与技术,南京:东南大学出版社,1993
[16]张林,杜凯等.紫外激光Si02减反膜的制备.光学学报.1996,16(7)
[17]范正修,胡海洋.高强度激光薄膜的研制.1999,11(2)
[18]Helene Krol,Laurent Gallais,Jean-Yves Natoli et al.Development of 2μm laser damage test facility[C].Proc.SPIE,2005
[19]Inoue A,Shigehara M.Fabrication and application of fiber bragg grating-A revie.Optoelectron Devices Technol,1995
[20]尤大伟,李晓谦,王怡德,林永昌.走向工业应用的离子辅助光学镀膜技术.中国电工技术学会.1999:203-208
[21]沈军,张勤远,杨天河等.高折射率光学薄膜的化学法制备研究.强激光与粒子束.1999(11):609-612
[22]吕俊霞,马月英.软x射线多层膜的应用及发展,物理,27(6),1998:358-360,337
[23]舒雄文,徐晨,田增霞,罗丹,沈光地.电子束蒸发非晶硅光学薄膜工艺研究. 光电子激光.2006,17(8)
[24]王学华,薛亦渝,赵利,张幼陵.电子束蒸发沉积TiO_2薄膜结构及光学性能的研究.武汉理工大学学报.2002,24(11)
[25]Hagfeldt A,Wachopoulos N,Chlbert S,et al.Electro--chromic switching with nanocrystalline TiO2semiconductor films[J].SPIE,1994,22.55:297-304
[26]Jiaguo Yu,Xiujian Zhao.Effect of substrates on thephotocatalytic activity of nanometer Ti02 thin films[J].Materials Research Bulletin,2000,35:1293-1301
[27]王学华,薛亦渝,赵利等.电子束蒸发制备TiO_2薄膜结构及光学性能的研究[J].武汉理工大学学报.2002,24(11):11-14
[28]唐晋发,郑权.应用薄膜光学.上海:上海科学技术出版社,1984
[29]Nobuaki Negishi,Koji Takeuchi.Structural changes oftransparent Ti02thin films with heat treatment[J].Materia]s Letters.1999,38:150-153
[30]张月街,徐政等.磁控溅射法制备非晶碳膜及其光学性能.同济大学学报.1999,27(6):681-684
[31]王明利,增田清志(日).高精度光学薄膜的制造.《光学仪器》编辑部,2001
[32]田民波.薄膜技术与薄膜材料.北京:清华大学出版社,2006
[33]唐晋发,顾培夫,刘旭,李海峰.现代光学薄膜技术.浙江:浙江大学出版社,2006
[34]林洪榕,迟晓玲,李利军.光滤波器结构、原理与特性.激光与光电子学进展.2001(11):31-36
[35]许世军,任小玲.光学镀膜仪的监控稳定性研究.真空.2006(43):54-57
[36]YK Ha,YC Yang,JE Kim,HY Park,Tunable omnidirectional reflection bands and defect modes of aone -dimensionalph otonicb andg aps tructurew ithl iquidc rystals,Ap pl.Phys.Lett.2001,79:15-17
[37]M Cenini,C Sibilia,G D'Aguanno,et al,Reflectivity control via second-order interaction process inone -dimensionalph otouicb and-gaps tructures,Opt.Commun.2000(18)
[38]田民波,刘德令编译.薄膜科学与技术手册(下册).北京:机械工业出版社,1991
[39]王向晖,张峰,李昌荣,郑志宏,陈莉芝,王惠民,柳襄怀.氧分压对动态离子束辅助沉合成的氧化钦膜的影响.功能材料与器件学报.Vol.7.No.1,March,2001
[40]王学华,薛亦渝.温度条件对反应电子束蒸发制备TiO_2薄膜结构和性能的影响.J.Appl ied Optics,March,2004,25(2):55-57
[41]杨邦朝,王文生.薄膜物理与技术.成都:电子科技大学出版社,1994
[42]郭清萍,武正簧,赵君芙,武正榜,李文漪.CVD法TiO_2薄膜的制备条件及光学性质的研究太原理工大学学报.1998(5)
[43]黄心耕,刘江.从欧洲真空镀膜会议分析光学薄膜及其技术发展.光学仪器,21(5):238-242
[44]陈文梅,杨算先.工艺参数对TiO_2薄膜性能的影响.玻璃与陶瓷.2001,29(4):18-21
[45]万刚,叶得军.硅太阳能电池减反射膜的优化设计.上海交通大学学报.1998,32(12):2123
[46]李学丹,万英超,姜祥祺.真空沉积技术.浙江:浙江大学出版社,1994
[47]汪之江.光学技术手册[M].北京:机械工业出版社,1994
[48]李云奇.真空薄膜技术与设备.沈阳:东北工学院出版社,1989
[49]杨帮朝,土文生.薄膜物理与技术.成都:电子科技大学出版社,1994
[50]王学华,薛亦渝,赵利等.电子束蒸发制备TiO_2薄膜结构及光学性能的研究[J].武汉理工大学学报.2002,24(11):11-14
[51]孔明东,李瑞洁.高反射率光学薄膜的一种新设计方法.光电子·激光.2000,11(1):62-64
[52]Koumei.Baba.Synthesisan dp ropertiesof TiO_2 thinfilmsby plasmaso urceionim plantation.Su rfaceand Coatings Technology,2001(136)
[53]Nobuaki Negishi,Koji Takeuchi.Structural changes oftransparent TiO_2 thin films with heat treatment[J].M aterials Letters,19999(38):150-153
[54]Wei-XingX u,Sh uZ hu,X PSst udyof TiO_x th infi lmsd epositedo ng lass substratesb yth eso 1--gelp rocess.A ppliedS urfaceS cience,1998(136):194-205
[55]YasumiY amada.Lo w-temperatured epositiono fop ticalfil msb yo xygenr adical beam-assistede vaporation[J].Thin Solid Films,2000:377-378
[56]JisguoY u,XiujianZ hao.E fectof su rfacest ructureo np hotocatalyticac tivityo TiO_2 th infilmsp reparedb ys ol-gelm ethod.T binS olidF ilms,2000(379):7-14
[2]乔在祥,文浚.热光伏技术的研究进展.电源技术.2005(29):57-61
[3]陈雪,宣益民.热光伏技术基本原理与研究进展.半导体光电.2006,27(8):353-368
[4]林永昌,卢维强.光学薄膜原理.北京:国防工业出版社,1990
[5]唐晋发,顾培夫.薄膜光学与技术.北京:机械工业出版社,1987
[6]尹树百.薄膜光学--理论与实践.北京:科学出版社,1987
[7]唐伟忠.薄膜材料制备原理、技术及应用.北京:冶金工业出版社,1998
[8]张荣军,郑玉祥等.光学滤波片薄膜镀制工艺中的监控技术模拟分析.红外与毫米波学报.2003(22):56-58
[9]严一心,林鸿海.薄膜技术.北京:兵器工业出版社,1994
[10]田明波,刘德令.薄膜科学与技术手册.北京:机械工业出版社,1991
[11]王力衡等.薄膜技术.北京:清华大学出版社,1991
[12]麻莳立男(日).薄膜技术基础.北京:电子工业出版社,1996
[13]赵妙,周代兵等.双源电子束蒸发制备Si/SiO_2光学薄膜的工艺.半导体学报.2006(27):1586-1589
[14]郭屏.荷能离子束沉积的氧化物薄膜光学性质.光学仪器.1999(21):56-61
[15]陈国平主编.薄膜物理与技术,南京:东南大学出版社,1993
[16]张林,杜凯等.紫外激光Si02减反膜的制备.光学学报.1996,16(7)
[17]范正修,胡海洋.高强度激光薄膜的研制.1999,11(2)
[18]Helene Krol,Laurent Gallais,Jean-Yves Natoli et al.Development of 2μm laser damage test facility[C].Proc.SPIE,2005
[19]Inoue A,Shigehara M.Fabrication and application of fiber bragg grating-A revie.Optoelectron Devices Technol,1995
[20]尤大伟,李晓谦,王怡德,林永昌.走向工业应用的离子辅助光学镀膜技术.中国电工技术学会.1999:203-208
[21]沈军,张勤远,杨天河等.高折射率光学薄膜的化学法制备研究.强激光与粒子束.1999(11):609-612
[22]吕俊霞,马月英.软x射线多层膜的应用及发展,物理,27(6),1998:358-360,337
[23]舒雄文,徐晨,田增霞,罗丹,沈光地.电子束蒸发非晶硅光学薄膜工艺研究. 光电子激光.2006,17(8)
[24]王学华,薛亦渝,赵利,张幼陵.电子束蒸发沉积TiO_2薄膜结构及光学性能的研究.武汉理工大学学报.2002,24(11)
[25]Hagfeldt A,Wachopoulos N,Chlbert S,et al.Electro--chromic switching with nanocrystalline TiO2semiconductor films[J].SPIE,1994,22.55:297-304
[26]Jiaguo Yu,Xiujian Zhao.Effect of substrates on thephotocatalytic activity of nanometer Ti02 thin films[J].Materials Research Bulletin,2000,35:1293-1301
[27]王学华,薛亦渝,赵利等.电子束蒸发制备TiO_2薄膜结构及光学性能的研究[J].武汉理工大学学报.2002,24(11):11-14
[28]唐晋发,郑权.应用薄膜光学.上海:上海科学技术出版社,1984
[29]Nobuaki Negishi,Koji Takeuchi.Structural changes oftransparent Ti02thin films with heat treatment[J].Materia]s Letters.1999,38:150-153
[30]张月街,徐政等.磁控溅射法制备非晶碳膜及其光学性能.同济大学学报.1999,27(6):681-684
[31]王明利,增田清志(日).高精度光学薄膜的制造.《光学仪器》编辑部,2001
[32]田民波.薄膜技术与薄膜材料.北京:清华大学出版社,2006
[33]唐晋发,顾培夫,刘旭,李海峰.现代光学薄膜技术.浙江:浙江大学出版社,2006
[34]林洪榕,迟晓玲,李利军.光滤波器结构、原理与特性.激光与光电子学进展.2001(11):31-36
[35]许世军,任小玲.光学镀膜仪的监控稳定性研究.真空.2006(43):54-57
[36]YK Ha,YC Yang,JE Kim,HY Park,Tunable omnidirectional reflection bands and defect modes of aone -dimensionalph otonicb andg aps tructurew ithl iquidc rystals,Ap pl.Phys.Lett.2001,79:15-17
[37]M Cenini,C Sibilia,G D'Aguanno,et al,Reflectivity control via second-order interaction process inone -dimensionalph otouicb and-gaps tructures,Opt.Commun.2000(18)
[38]田民波,刘德令编译.薄膜科学与技术手册(下册).北京:机械工业出版社,1991
[39]王向晖,张峰,李昌荣,郑志宏,陈莉芝,王惠民,柳襄怀.氧分压对动态离子束辅助沉合成的氧化钦膜的影响.功能材料与器件学报.Vol.7.No.1,March,2001
[40]王学华,薛亦渝.温度条件对反应电子束蒸发制备TiO_2薄膜结构和性能的影响.J.Appl ied Optics,March,2004,25(2):55-57
[41]杨邦朝,王文生.薄膜物理与技术.成都:电子科技大学出版社,1994
[42]郭清萍,武正簧,赵君芙,武正榜,李文漪.CVD法TiO_2薄膜的制备条件及光学性质的研究太原理工大学学报.1998(5)
[43]黄心耕,刘江.从欧洲真空镀膜会议分析光学薄膜及其技术发展.光学仪器,21(5):238-242
[44]陈文梅,杨算先.工艺参数对TiO_2薄膜性能的影响.玻璃与陶瓷.2001,29(4):18-21
[45]万刚,叶得军.硅太阳能电池减反射膜的优化设计.上海交通大学学报.1998,32(12):2123
[46]李学丹,万英超,姜祥祺.真空沉积技术.浙江:浙江大学出版社,1994
[47]汪之江.光学技术手册[M].北京:机械工业出版社,1994
[48]李云奇.真空薄膜技术与设备.沈阳:东北工学院出版社,1989
[49]杨帮朝,土文生.薄膜物理与技术.成都:电子科技大学出版社,1994
[50]王学华,薛亦渝,赵利等.电子束蒸发制备TiO_2薄膜结构及光学性能的研究[J].武汉理工大学学报.2002,24(11):11-14
[51]孔明东,李瑞洁.高反射率光学薄膜的一种新设计方法.光电子·激光.2000,11(1):62-64
[52]Koumei.Baba.Synthesisan dp ropertiesof TiO_2 thinfilmsby plasmaso urceionim plantation.Su rfaceand Coatings Technology,2001(136)
[53]Nobuaki Negishi,Koji Takeuchi.Structural changes oftransparent TiO_2 thin films with heat treatment[J].M aterials Letters,19999(38):150-153
[54]Wei-XingX u,Sh uZ hu,X PSst udyof TiO_x th infi lmsd epositedo ng lass substratesb yth eso 1--gelp rocess.A ppliedS urfaceS cience,1998(136):194-205
[55]YasumiY amada.Lo w-temperatured epositiono fop ticalfil msb yo xygenr adical beam-assistede vaporation[J].Thin Solid Films,2000:377-378
[56]JisguoY u,XiujianZ hao.E fectof su rfacest ructureo np hotocatalyticac tivityo TiO_2 th infilmsp reparedb ys ol-gelm ethod.T binS olidF ilms,2000(379):7-14