用户名: 密码: 验证码:
掠射软X射线荧光分析技术研究
详细信息    本馆镜像全文|  推荐本文 |  |   获取CNKI官网全文
摘要
掠射X射线分析是近年来迅速发展的一门分析技术,在科学研究以及分析检测和质量控制等生产领域都有着广泛的应用。X射线分析技术具有试样无损分析、制样经济方便、操作简单、分析结果重现性好及精度高等优点,使得这项技术在薄膜特性分析、半导体材料及磁铁材料表面检测方面受到特别的青睐。本文在综述了国内外掠射X射线荧光分析技术的研发和应用的基础上,对掠出射X射线荧光技术在薄膜特性分析上的理论、装置和实验三方面进行了研究。
     在理论研究方面,首先讨论了软X射线荧光产生的原子物理相关理论;其次根据洛伦兹互换定理,得出了掠出射和掠入射两种荧光分析理论具有互换性的结论。介绍了掠射X射线与薄膜样品作用时产生的干涉现象,给出了X射线双光束干涉和多光束干涉产生极值的条件。最后,利用平稳位相方法建立了掠出射情况下薄层样品产生的荧光强度和掠出射角的对应关系数学模型,推导了薄层样品荧光强度理论计算公式,并以此为依据模拟计算得出了Cr、Fe、Ti和Ni等几种以Si作基底的单层薄膜样品的荧光强度随掠出射角变化的理论曲线。
     在装置研究方面,提出了掠出射软X射线荧光分析装置的结构布局要求,并利用实验室现有的一台单色仪,设计并建造了国内首台掠出射软X射线荧光光谱仪。光谱仪包括激发光源、精密样品台、单色仪系统、探测和数据处理系统等几部分,其特点是采用超薄窗流气正比计数管作探测器的波长色散系统,适合探测样品产生的软X射线荧光。
     在实验研究方面,首先对掠出射X射线荧光光谱仪的色散单元进行了调整和波长标定。其次利用~(55)Fe作放射源对探测器和MCA多道分析系统进行了标校。最后利用同步辐射光源做激发源,在掠出射方式下研究了Si片上不同厚度单层Cr膜和双层Fe/V膜样品产生的荧光光强和掠出射角的对应关系。实验结果和理论计算符合得很好,这表明掠出射X射线荧光光谱分析技术完全可以用来分析薄膜厚度等特性。
     本论文采用理论、装置和实验研究密切结合的方式,开展了掠射X射线荧光分析技术研究工作,在国内建立了首台掠出射X射线荧光光谱分析装置,并对不同厚度单层和双层薄膜样品在掠出射条件下产生的荧光光强与掠射角的对应
    
    博士学位论文:掠射X射线荧光分析技术研究
    关系进行了实验测定。本文所进行的工作为进一步开展掠射X射线荧光分析技术
    研究奠定了基础。
Grazing X-ray fluorescence analysis is a new development approach of x-ray fluorescence technique in recent years. It will have good prospects and wide application in various fields, such as scientific research, quality monitoring and controlling. Especially, it becomes more and more important in the field of analysis of the thin layer's characteristics, analysis of contaminants on semiconductor wafers and surface test for ferromagnetic substance. Because grazing x-ray fluorescence techniques have the advantages, which are non-destructive nature analysis method, simple and economical for sample preparation, good fidelity and high precision for results. In this dissertation, according to the summarization of R&D and application of this kind of techniques, the theory, setup and experiment of grazing-emission x-ray fluorescence techniques are studied, which is used to characterize thin layer characteristics.
    In theory, firstly, the theorectical considerations on soft X-ray are discussed. Secondly, the conclusion is obtained based on the applying the Lorentz reciprocity theorem, which demonstrates that equivalence of brazing exit and grazing incidence methods. The phenomenon of interference is presented when the X-ray beam hits the thin layer sample at glancing angle, the angles corresponding maximal and minimal intensity of x-ray fluorescence are described when the phenomenon of double-beam interference or multiple-beam interference is occurred. In the theoretical description of grazing emission fluorescence, the mode of fluorescence intensity emitted from layered materials dependence of grazing angle is established by applying asymptotic approximations to double Fourier integrals, and the theoretic calculation formula of fluorescence intensity from a thin layer is derived. By the derived expressions, the theoretic simulation curves of several thin layers on Si substrate are calculated.
    In the experimental setup, the requirement of construction of the setup and some important parameters are brought forward. By using of an old monochomator, a set of grazing emission X-ray fluorescence spectrometer, which includes exciting source,
    
    
    
    fine sample stage, a monochromator, detecting sub-system and data processing sub-system, is designed and built with many limiting conditions exist in our laboratory. The spectrometer is the first one in our domestic area, which allows the use of gas-flow proportional counter and wavelength dispersive method. This type of configuration has the advantages of better energy resolution at longer wavelengths (soft x-ray and light elements) and a much larger dynamic range than the energy dispersive method.
    In experiment, the alignment and calibration to the monochromator were described firstly. Then, a gas-flow proportional counter and the Multi-Channel Analyzer (MCA) are calibrated by the radio isotope source 55Fe, and the dead time, counting rate plateau and x-ray linearity have been measured. Finally, the angular dependence of the top layer fluorescence intensity was investigated when varying the thickness of the top layer. The experimental results are good agreement with the theoretical calculations. This demonstrates the feasibility of using grazing emission x-ray fluorescence spectroscopy as a method of studying the thin layer's characteristics, such as composition and thickiness etc.
    With the intimately combining of theoretical, set-up and experimental research, the study on the analysis techniques of grazing emission x-ray fluorescence is developed, and the first set of grazing emission x-ray fluorescence setup is established. At the same time, the angular dependence of the fluorescence intensity with different thickness layer is measured. All the work in this thesis provides the basis for the further researches.
引文
[1] E.P伯廷.X射线光谱分析的原理和应用.北京:国防工业出版社,1983.
    [2] 刘亚雯.掠入射、全反射及其在X射线荧光分析中的应用,现代科学仪器.1993,22(10):614-618.
    [3] 范钦敏 刘亚雯等.纳克级全反射X射线荧光分析.光谱学与光谱分析,1990,Vol.10(6):64-67.
    [4] E. Spiller. Experience with the in situ monitor system for fabrication of X-ray mirrors. Proc. SPIE, 1985, Volo563: 367-375.
    [5] 尤金.P 伯廷.X射线光谱分析导论.北京:地质出版社,1981。
    [6] Yoneda Y., Horiuchi T..Optical flats for use in x-ray spectrochemical microanalysis. Rev. Sci. Instrum. 1971, Vol. 42(7): 1069-1070.
    [7] Aiginger, H., and Wobrauschek, P. A method for quantitative x-ray fluorescence analysis in the nanogran region. Nucl. Instrum. Methods, 1974,114: 157-158.
    [8] P. Wobrauschekand H. Aiginger. Total-reflection x-ray fluorescence spectrometric determination of elements in nanogram amounts. Anal. Chem. 1975, Vol. 47(6):852-855.
    [9] H.Schwenke and J. Knoth. A highly sensitive eneggy -dispersive x-ray spectrometer with multiple total reflection of the exciting beam. Nucl. Instrum. Methods. 1982, 193:239-243.
    [10] Brooke Noack, Tim Z. Hossain. Technique to annlyze large area surface roughness of a Wafer using TXRF. 1998, SPIE Vol. 3509:228-230.
    [11] Motoyuki Yamagami, Masahiro Nonoguchi, et al.,VPD/TXRF analysis of Trace elements on a silicon wafer. X-ray Spectrometry, 1999, 28:451-455.
    [12] Cornelia A. Weiss Tim Z. Hossain, et al., Rapid in-fab monitoring of ion implant doses using total reflection X-ray fluorescence. 1997, SPIE Vol. 3215:129-136.
    [13] K.N. Stoev. Study on jounal distribultion of publication in the field of x-ray fluorescence analysis. X-ray Spectrom. 1994, Vol. 23: 229-235.
    [14] Hayashi K, Horiuchi T. and Matsushige K., Adv. in X-ray Chem. Anal. Japan, 1995,26s:125.
    [15] Toshihisa Horiuchi. Initial idea to use optical flts for x-ray fluorescence ananlysis and recent app; ications to diffraction studies. Spectrochim. Acta, 1993, Vol. 48B: 129-136.
    [16] Yuji Sasaki, Kichinosuke Hurokawa. Refraction effect of Scattered X-ray fluorescence at surface. Appl. Phys. A, 1990,50:397-404
    [17] Shoza Ino. Adv. in X-ray Chem. Anal, Japan. 1995, 26s: 187.
    
    
    [18] L. G. Parratt. Surface studies of solids by total reflection of X-rays. Phy. Rev., 1954, Vol.95 (2) : 359-369.
    [19] Klockenkamper R, Total-Reflection X-Ray Fluorescence Analysis. New York: Wiley press, 1997.
    [20] G. Tolg and R. Klockenkamper. The role of total-reflection X-ray fluorescence in atomic spectroscopy. Spectrochim. Acta, 1993, Vol.48B(2) : 111-127.
    [21] T. Noma and A. Iida. Surface ananlysis of layered thin films using a synchrotron x-ray microbeam combined with a grazing-exit condition. Rev. Sci. Instr., 1994, Vol.65 (4) : 837-844.
    [22] J. Knoth, H. Schwenke et al., J. clin. Chem. Clin. Biochem.. 1977, Vol. 15:557.
    [23] J. Knoth, H. Schwenke. An X-ray fluorescence spectrumeter with totally reflecting sample support trace analysis at ppb level. F. Z. Anal. Chem. 1978, Vol. 291:200-204.
    [24] J. Knoth, H. Schwenke. Trace element enrichment on a quartz glass surface used as a sample support of an x-ray spectrometer for the subnanogram range. F. Z. Anal. Chem. 1979, Vol. 294:273-274.
    [25] J. Knoth, H. Schwenke. A new totally reflecting x-ray fluorescence spectrometer with detection limits below 10-11g. F.Z.Anal. Chem., 1980,Vol. 301:7-9.
    [26] J.Knoth, H.Schwenke, Adv. X-Ray Anal., 1988, Vol. 31:29.
    [27] P. Wobrauschek, H. Aiginger. X-ray fluorescence analysis in the ng region using total reflection of the primary beam. Spectrochimica Acta,1980,Vol. 356:607-614.
    [28] P. Wobrauschek, P. Kregsamer and H.Aiginger. Instrumental developments in total reflection x-ray fluorescence annlysis for K-lines from Oxygen to the rare earth elements. X-ray Spectrometry, 1990, Vol. 20:23-28.
    [29] W. Ladisich, R. Rieder and P. Wobranschek. Quantitative total reflection x-ray fluorescence analysis with monoenergetic excitation. X-ray Spectrometry, 1994,Vol. 23: 173-177.
    [30] Christina Streli. Development of total reflection x-ray fluorescence analysis at the Atominstitute of the Austrian Universities. X-ray Spectrometry, 2000,Vol. 29: 203-211.
    [31 ] T. W. Barbee, Jr. and W. K. Warburton. Mater, Lett., 1984, Vol. (3) 17:543-548.
    [32] Wolfgang Ladisich, Robert Rieder, Peter Wobranschek and et. al.. Total reflection X-ray fluorescence ananlysis with monoenergetic excitation and full spectrum excitation using ratating anode x-ray tubes. Nuclear Instrumments and methods in physics research 1993, A330:501-506.
    [33] W. Frank, H. Thomas, A. Schindler, Depth profiling by means of combination
    
    of glancing-incidence X-ray fluorescence spectrometry with low energy ion beam etching technique, Spetrochim. Acta, 1994, 50B: 265-270.
    [34] R. S. Becker, J. A. Golovchenko and J. R. Patel. X-ray evanscenct-wave absorption and emission. Physical review letters, 1983, Vol.50 (3) : 153-156.
    [35] Born, Max. Principles of Optics. London: Cambridge university press, 1999, 7th ed.
    [36] P. K. de Bolox and P. Urbach. Laboratory grazing-emission x-ray fluorescence spectrometer. Rev. Sci. Instrum. 1995,66(1) : 15-18.
    [37] H.Paul Urbach and Pieter K. de Bokx. Calculation of Fluorescece Intensities in Grazing-emission x_ray fluorescence spectrometry. Analysis Sciences, 1995, Vol. 11:549-552.
    [38] Martine Claes, Rene Van Grieken et al. .Comparision of grazing emission XRF with total reflection XRF and other X-ray emission techniques. X-ray Spectrom 1997,26:153-158.
    [39] T. Noma, H. Miyata and S. Ino. Grazing exit x-ray fluorescence spectroscopy for thin-film analysis. Jpn. J. Appl. Phys. , 1992, Vol. 31(7A):L900-L903.
    [40] Takashi Noma and Atsuo lida. Surface analysis of layered thin films using a synchrotron x-ray microbeam combined with a grazing-exit condition. Rev. Sci. Instrum. 1994, 65(4) :837-844.
    [41] T. Noma , K. Takada and A. Iida. Surface-sensitive x-ray fluorescence and diffraction analysis withgrazing-exit geometry. X-ray Spectrom., 1999, 28:433-439.
    [42] Martine Claes and Pieter de Bokx et al.. Progress in laboratory grazing emission X-ray flurescence spectrometry. X-ray Spectrom, 1999, 28:224-229.
    [43] N. Miyata, S. Ishikawa and M. Yanagihara et al. .Buried interfaces in Mo/Si Multilayers studied by soft x-ray emission spectroscopy.
    [44] Yuji Sasaki and Kichinosuke Hirokawa. Refraction Effect of Scattered X-ray Flurescence at Surface. Appl. Phys., 1990, A50: 97-404.
    [45] Yuji C. Sasaki. The form change of metal thin film as measured by the refracted X-ray Fluorescence (RXF) method. Japanese J. Appl. Phys. 4B, 1991, Vol.30: L761-L763.
    [46] Yuji C.Sasaki and Kichinosuke Hirokawa, New nondestructive depth profile measurement by using a refracted x-ray fluorescence method, Appl. Phys. Lett 1991,58(13) : 1384-1386.
    [47] Kouichi Tsuji, Zoya Spolnik and Kazuaki Wagatsuma et al.. Grazing-exit x-ray spectrometry for surface and thin-film analyses. Analytical Scences, 2001, Vol. 17: 145-148.
    [48] Per Skytt, Bjorn Galnander and Tomas Nyberg et al. Probe depth variation in
    
    grazing exit soft-X-ray emission spectroscopy. Nucl. Instr. and Meth. in Phys. Res. 1997,A384:558-562.
    [49] B. Galnander T Kaambre, and P. blomquist et al. . Non-destructive chemical analysis of sandwich structures by means of soft-X-ray emission. Thin Solid Film, 1999, 343-344:35-38.
    [50] K. Tsuji.K Wagatsuma, R Mullens, and R. Van Grieken. Anal. Chem. , 1999,71:2497.
    [51] Kouichi Tsuji and Kichinosuke Hirokawa. Take-off angel-dependent X-ray fluorescence of thin films as glancing incidence. Spectrochimica Acta. Vol.48B (12) : 1471-1480.
    [52] Kouichi Tsuji, Shigeo Sato, and Kichinosuke Hirokawa. Surface-sensitive x-ray fluorescence analysis at glancing incident and takeoff angles. J. Appl. Phys. 1994, 76 (12) :7860-7863.
    [53] Kouichi Tsuji and Kazuaki Wagatsuma, Solid surface density determination using the glancing-takeoff X-ray fluorescence method. Jpn. J. Appl. Phys., 1996,Vol. 35:1535-1537.
    [54] Kouichi Tsuji Kazuaki Wagatsuma and Takeo Oku. Glancing-incidence and glancing-takeoff x-ray fluorescence analysis of Ni-GaAs interface reactions.X-ray Spectrom,2000:29:155-160.
    [55] Kouichi Tsuji and Kichinosuke Hirokawa. Takeoff angle dependent x-ray fluorescence of layered materials using a glancing incident x-ray beam. J. Appl. Phys. 1994, 75(11) : 7189-7194.
    [56] K. Tsuji, S. Sato and K. Hirokawa. Depth profiling using the glancing-incidence and glancing-takeoff x-ray fluorescence method. Rev. Sci. Instrum., 1995, 66(10) :4847-4852.
    [57] S. Sato, K. Tsuji and K. Hirokawa. Evaluation of Ni/Mn multilayer samples with glancing-incidence and take-off X-ray fluorescence analysis. Appl. Phys. 1996,A62: 87-93.
    [58] Roberto D. Perez and Hector Jorge Sanchez. New spectrometer for grazing exits x-ray fluorescence. Rev. Sci. Instrum., 1997, 68(7) : 2681-2684.
    [59] 刘亚雯,肖辉.掠射技术与X射线荧光分析.光谱学与光谱分析,1998,Vol.18(5) :609-613.
    [60] Shinichi Terada, Hiroyuki Murakami and Kazuo Nishihagi. Thickness and composition measurement for thin film with combined x-ray technique. 1999IEEE/SEMI Advanced Semiconductor Manufacturing Conference: 414-419.
    [61] Shinichi Terada, Hiroyuki Murakami and Kazuo Nishihagi. Thickness and Density Measurement for new materials with combined x-ray technique. 2001 IEEE/SEMI
    
    Advanced Semiconductor Manufacturing Conference: 125-130.
    [62] 陶光仪.X射线荧光光谱分析.分析试验室,1997,Vol.16(3):94-100.
    [63] 罗立强,马光祖.X射线荧光与粒子激发X射线光谱分析.分析试验室,1999,Vol.18(4):100-104.
    [64] 吉昂,卓尚军.X射线荧光光谱分析.分析试验室,2001,Vol.20(4):103-107.
    [65] 刘亚文.全反射X射线荧光分析法.光谱学与光谱分析,Vol.7(4):69-73.
    [66] 李学军,巢志瑜,冼鼎昌.同步辐射X射线荧光分析,物理,1993,22(9):553—558.
    [67] 赵利敏,冼鼎昌.全反射X射线荧光分析.物理,1997,26(11):661—665.
    [68] 金立云,黄清良,李云等.两次全反射X射线荧光能谱分析仪的研制.原子能科学技术,1995,Vol.29(5):401—406.
    [69] 李国会,朱永奉.全反射X射线荧光光谱仪的研制.分析测试仪器通讯,1995,5(3):129.
    [70] Tian Y H, Liu K, and Wu X R. et al..A small TXRF ananluzer and its applications. J. Radioanal.& Nucl. Chem. 1997, Vol. 217(2):243-245.
    [71] 田宇紘,刘凯,邬旭然等.基于全反射原理的X荧光分析技术及其应用研究.光谱学与光谱分析,1999,Vol.19(3):430-433.
    [72] 吴应荣,巢志瑜等.同步辐射微束X射线荧光分析实验站.高能物理与核物理,1997,Vol.21(5):475-480.
    [73] 颜一鸣.使用X光聚束系统的X射线荧光分析研究.核技术,1994,Vol.17(6):340-342.
    [74] 崔乃俊.全反射荧光X射线分析法.现代科学仪器,1993,2:13-15.
    [75] 范钦敏,刘亚雯等,纳克级全反射X射线荧光分析.光谱学与光谱分析,1990,Vol.10(6):64-67.
    [76] 刘亚雯,范钦敏等,全反射X射线荧光分析法测定微量硒,光谱学与光谱分析,1993,Vol.13(3):69-72.
    [77] 赵利敏,吴应荣,黄宇营等,全反射X射线荧光分析在生物医学中的应用.高能物理与核物理,1998,Vol.22(2):186—191.
    [78] 黄宇营,李光城,何伟等.北京同步辐射X射线荧光微束分析进展.中国科学技术大学学报,2000,Vol.30 增刊:147-151.
    [79] 严京峰,吴念祖等.MnO_3在Al_2O_3薄膜表面扩散的研究.物理化学学报,1999,Vol.15(2):684-687.
    [80] 敖奇.X射线荧光分析层模型.光谱学与光谱分析,1990,Vol.10(4):35-41.
    [81] 陶光仪,吉昂等.计算多层膜组分和厚度的软件FPMULTI及其应用.光谱学与光谱分析,1999,Vol.19(2):215-218.
    [82] David Attwood. Soft X-Ray and Extreme Ultraviolet Radiation. United Kingdom, Cambraidge University Press: 1999.
    [83] Grant, I.P. Relativistic Calculation of Atomic Structures. 1970, Adv. Phys.
    
    Vol. (19):745-748.
    [84] E.U. Condon, G.H. Shortley. Theory of atomic spectra. Cambridge, Cambridge University Press: 1979..
    [85] Akhiezer, A.I..Quantum Electrodynamics. New York, Interscience Publishing Co.:1965.
    [86] J.D. Jackson. Classical Electrodynamics, New York, Wiley: 1998,3rd ed..
    [87] D. Attwood. Soft X-ray and Extreme Ultraviolet: Principles and Applications. Cambridge, Cambridge University Press:2000.
    [88] A.H. Computon and S.K. Allison. X-rays in Theory and Expriment. New York, Van Nostrand: 1965.
    [89] 曾谨言.量子力学.北京,科学出版社:1997,第二版.
    [90] Born, M.,and Wolf, E..principle of Optics. Pergamon: Oxford Press, 6th ed.,1993.
    [91] De Boer, D.K.G. Glanceing-incidence x-ray fluorescence of layer materials. Phys. Rev. B, 1991, Vol. 44(2):498-511.
    [92] De Boer, D.K. G. and Leenaers, A.J.G.. Glanceing-incidence x-ray analysis of thin-layered materials:a review. X-Ray Spectrom, 1995, Vol. 24:91-102.
    [93] M.J. Bedzyk, G. M. Bommarito and J.S. Schildkraut. X-ray standing waves at a reflecting mirror surface. J.S. Phys. Rev. Lett.,1989, Vol. 62(12):1376-1379.
    [94] M. Block, M.Sansone, F. Rondelez, D.G. Pfeiffer, et al. Phys. Rev. Lett., 1985,54:1039.
    [95] Klockenkamper, R., Knoth, J. and Prange, A.,et al. Anal Chem., 1992, Vol. 64,1115A.
    [96] 徐利治,陈文忠.渐近分析方法及应用.北京:国防工业出版社,1991.
    [97] B.L. Henke, P. Lee, T.J. Tanaka, etc. Low—enengry x-ray interaction coefficients: Photo absorption, Scattering and reflection. 1982, Atomic Data and Nuclear Data Tables, Vol. 27(1):1-141.
    [98] Ron Jenkins. X-ray Fluorescence Spectroetry. New York:John Wiley &Son, Inc. 1999. 2nd ed.
    [99] P.K. de Bokx, Chr. Kok, and A. Bailleul et al. Grazing-emission X-ray fluorescence spectrumery:principle and applications. Spectrochim. Acta Part B52 1997:829-840.
    [100] 孙景文.X射线与真空紫外辐射源及其计量技术.北京:国防工业出版社.2001年第一版.
    [101] Ernst-Eckhard Koch. Handbool on Synchrotron Radiation. Volume 1A. Amsterdam, New York, Oxford:North-Holland Publishing Company. 1983
    [102] RQ 20/63型X光管操作手册.LEybold-Heraeus GMBH Inc.1983.
    [103] http://www.osmic.com/
    [104] J.A.R. Samson. Techniques of Vacuum Ultraviolet Spectroscopy. London: Pied
    
    Publication. 1967.
    [105] Manual of Mcpherson Monochromator. 1982
    [106] Ron Jenkins. X-ray Fluorescence Spectrometry. New York: John Wiley & Sons, Inc. 1999, Second Edition.
    [107] Bourgrade J L, et al. Rev. Sci. Instrum. 1986,57 (8): 2165.
    [108] BarbeeTW, Jr AIP Conf No. 75 New Vork:AIN
    [109] 田民波,刘德令.薄膜科学与技术手册.北京:机械工业出版社.1991年第一版.
    [110] 马礼敦,杨福家主编。同步辐射应用概论.上海:复旦大学出版社.2001年第一版.
    [111] T. vanBuurenl, T.D. Nguyenl, L.L. Chasel, L. J. Terminell, etc. Soft X-Ray Emission Studies of Thin Si/SiO2 Multilayers. Appl. Phys. Lett. 1990,56:379.
    [112] Nicholas E. Yanaki. Principle of X-ray Fluorescence Coating Measurements. Metal Finishing, b997: 33-35.
    [113] http://www.burle.com/
    [114] http://www.amptek.com/
    [115] 杨乐平,李海涛,肖相生。Labview程序设计与应用.北京:电子工业出版社.2001年第一版.
    [116] 林正盛.虚拟仪器技术及其发展.国外电子测量技术,1997,2:40-44.
    [117] Atsuo Iida. X-ray Spectrometric Applications of a Synchrotron X-ray Microbeam. X-Ray Spectrometry, 1997, Vol. (26):359-363。
    [118] http://www.ihep.ac.cn/bsrf/chinese/facility/beamline.htm

© 2004-2018 中国地质图书馆版权所有 京ICP备05064691号 京公网安备11010802017129号

地址:北京市海淀区学院路29号 邮编:100083

电话:办公室:(+86 10)66554848;文献借阅、咨询服务、科技查新:66554700