防溅射靶对离子推力器背溅射沉积污染的影响
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摘要
针对目前对真空舱背溅射沉积污染的计算模型误差较大的问题,对地面实验中离子推力器的背溅射沉积污染效应开展了研究,提出了更精确的计算模型。由于Reynolds的模型对束流密度在轴向上误差较大,采用改进型的离子束流模型对偏离推力器80cm位置的真空舱背溅射沉积率做了计算,并与实验结果对比校验,结果吻合较好。用校验过的模型对光舱环境和防溅射靶环境的背溅射沉积效应开展研究,研究结果显示:光舱工况的返流沉积率为2.36×10-10 g/(cm2·s),安装防溅射分子屏的工况在推力器上的背溅射沉积率为2.51×10-11 g/(cm2·s),结果表明添加防溅射分子屏后背溅射沉积污染量可以降低近1个量级。
Considering very large error of current back sputtering model,a model of higher accuracy was proposed.A improved ion current density model was used to calculate the back sputtering deposition in the 80 cm position deviating from the thruster while the Reynolds model had a big error.The calculated results agreed well with the experiment result.Then,the verified model was used to calculate the back sputtering deposition of bare chamber and the chamber with anti-sputtering target.The results showed that,the deposition rate of bare chamber case was 2.36×10-10 g/(cm2·s),while the anti-sputtering target shield case was 2.51×10-11 g/(cm2·s).It was clear that the back sputtering deposition yield with anti-sputtering target shield was an order of magnitude lower than the vacuum chamber without the anti-sputtering target.
Considering very large error of current back sputtering model,a model of higher accuracy was proposed.A improved ion current density model was used to calculate the back sputtering deposition in the 80 cm position deviating from the thruster while the Reynolds model had a big error.The calculated results agreed well with the experiment result.Then,the verified model was used to calculate the back sputtering deposition of bare chamber and the chamber with anti-sputtering target.The results showed that,the deposition rate of bare chamber case was 2.36×10-10 g/(cm2·s),while the anti-sputtering target shield case was 2.51×10-11 g/(cm2·s).It was clear that the back sputtering deposition yield with anti-sputtering target shield was an order of magnitude lower than the vacuum chamber without the anti-sputtering target.
引文
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[23]SHANG Shengfei,CAI Guobiao,ZHU Dingqiang,et al.Design of double-layer anti-sputtering targets for plume effects experimental system[J].Science China Technological Sciences,2016,59(8):1265-1275.
[2]田东波,沈青,樊菁.稳态等离子体推进器羽流的粒子模拟[J].空气动力学学报,2006,24(4):425-429.TIAN Dongbo,SHEN Qing,FAN Jing.The particle simulation of the plume flow exhausted from the stationary plasma thruster[J].Acta Aerodynamica Sinica,2006,24(4):425-429.(in Chinese)
[3]BIAGIONI L,BOCCALETTO L,MARCUCCIO S,et al.Alarge space simulator for electric propulsion testing design requirements and engineering analysis[R].AIAA-2000-3750,2000.
[4]BIAGIONI L,KIM V,D NICOLINI.Basic issues in electric propulsion testing and the need for international standards[R].International Electric Propulsion Conference,IEPC 03-230,2003.
[5]AHMED L N,MARK W C.Surface modification measurements in the T5ion thruster plume[J].Journal of Propulsion and Power,1998,14(3):336-347.
[6]POLK J E,ANDERSON J R,BROPHY J R.An over-view of the results from an 8200hour wear test of the NSTARion thruster[R].AIAA 99-2446,1999.
[7]POLK J E,ANDERSON J R,BROPHY J R,et al.The effect of engine wear on performance in the NSTAR 8000hour ion engine endurance test[R].[S.l.]:American Institute of Aeronautics and Astronautics,1997.
[8]JONATHAN L,VAN N,SOULAS G C.A facility and ion thruster back sputter survey for higher power ion thrusters[R].AIAA-2005-4067,2005.
[9]RANDOLPH T,KIM V,KAUFMAN H,et al.Facility effects on stationary plasma thruster testing[R].International Electric Propulsion Conference,IEPC 93-93,1993.
[10]张天平,李忠明.真空舱几何结构对离子推力器背溅射沉积影响的计算研究[J].真空科学与技术学报,2012,32(7):642-648.ZHANG Tianping,LI Zhongming.Simulation of influence of vacuum chamber geometry on ion thruster back-sputtering deposition[J].Chinese Journal of Vacuum Science and Technology,2012,32(7):642-648.(in Chinese)
[11]张天平,陈继巍,李小平,等.地面寿命试验中离子推力器表面的溅射沉积量计算[J].航天器环境工程,2011,28(5):436-439.ZHANG Tianping,CHEN Jiwei,LI Xiaoping,et al.Calculation of backsputter depositon on LIPS-200ion thruster in the life test[J].Spacecraft Environment Engineering,2011,28(5):436-439.(in Chinese)
[12]REYNOLDS T W.Mathematical representation of current density profiles from ion thrusters[R].AIAA 71-693,1971.
[13]MARK W C,NOCERINO J C,YOUNG J A.NEXT ion engine plume deposition rates:QCM measurements[R].National Harbor,Maryland:52nd Aerospace Sciences Meeting,2014.
[14]COLIN L M,CLEMONS L A,BANKS B A,et al.Transport of sputtered carbon during ground-based life testing of ion thrusters[R].AIAA-2005-4413,2005.
[15]商圣飞,顾左,贺碧蛟,等.离子推力器束流密度分布模型[J].真空科学与技术学报,2015,35(12):1414-1419.SHANG Shengfei,GU Zuo,HE Bijiao,et al.Modelling of ion beam current density of ion thruster[J].Chinese Journal of Vacuum Science and Technology,2015,35(12):1414-1419.(in Chinese)
[16]董树忠.多组分固体表面的择优溅射[J].物理,1985,14(3):135-140.DONG Shuzhong.Preferential sputtering on multicomponent solid surface[J].Physics,1985,14(3):135-140.(in Chinese)
[17]YAMAMURA Y.Theory of sputtering and comparision to experimental data[J].Nuclear Instruments and Methods,1982,194:515-522.
[18]ECKSTEIN W.Physical sputtering and reflection processes in plasma-wall interactions[J].Journal of Nuclear Materials,1997,248:1-8.
[19]ECKSTEIN W.Sputtering yields[J].Vacuum,2008,82:930-934.
[20]ECKSTEIN W,GARCIA R C,ROTH J.Threshold energy for sputtering and its dependence on angle of incidence[J].Nuclear Instruments and Methods in Physics Research:B,1993,83:95-109.
[21]ECKSTEIN W,PREUSS R.New fit formulae for the sputtering yield[J].Journal of Nuclear Materials,2003,320:209-213.
[22]YAMAMURA Y,ITIKAWA Y,ITOH N.Angular dependence of aputtering yields of monatomic solids[R].Nagoya:Nagoya University,1983.
[23]SHANG Shengfei,CAI Guobiao,ZHU Dingqiang,et al.Design of double-layer anti-sputtering targets for plume effects experimental system[J].Science China Technological Sciences,2016,59(8):1265-1275.