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镉掺杂氧化亚铜薄膜的制备及其光电性能
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  • 英文篇名:Preparation and Photoelectric Properties of Cd Doped Cu_2O Thin Films
  • 作者:赵英杰 ; 伍泳斌 ; 王晓娟 ; 莫德清 ; 钟福新
  • 英文作者:Zhao Yingjie;Wu Yongbin;Wang Xiaojuan;Mo Deqing;Zhong Fuxin;College of Chemistry and Bioengineering,Guilin University of Technology;School of Life and Environmental Sciences,Guilin University of Electronic Technology;
  • 关键词:水热法 ; 氧化亚铜 ; 光电性能 ; 光电压 ; Cd掺杂
  • 英文关键词:hydrothermal method;;cuprous oxide(Cu2O);;photoelectric property;;photovoltaic voltage;;Cd doping
  • 中文刊名:BDTJ
  • 英文刊名:Semiconductor Technology
  • 机构:桂林理工大学化学与生物工程学院;桂林电子科技大学生命与环境科学学院;
  • 出版日期:2019-01-03
  • 出版单位:半导体技术
  • 年:2019
  • 期:v.44;No.365
  • 基金:国家自然科学基金资助项目(61264007)
  • 语种:中文;
  • 页:BDTJ201901009
  • 页数:8
  • CN:01
  • ISSN:13-1109/TN
  • 分类号:50-57
摘要
采用一步水热法制备镉掺杂的Cu_2O薄膜(Cd/Cu_2O),分别探讨了制备过程中CuSO_4浓度、NaOH浓度、反应时间、反应温度和CdSO_4浓度对Cu_2O和Cd/Cu_2O薄膜光电性能的影响。结果表明,当反应釜中CuSO_4浓度为0.114 2 mol/L、NaOH浓度为0.028 6 mol/L、反应时间为8 h、反应温度为90℃、CdSO_4浓度分别为0 mol/L和0.571 4μmol/L时,可在基底Cu片上分别获得光电压为0.366 7 V的Cu_2O样品和光电压为0.460 2 V的Cd/Cu_2O薄膜样品。紫外可见吸收光谱(UV-Vis)、X射线衍射(XRD)图谱、扫描电子显微镜(SEM)和能谱仪(EDS)表征结果显示,Cu_2O的禁带宽度为2.1 eV,而Cd/Cu_2O的禁带宽度最小达到1.8 eV;Cd/Cu_2O的择优生长面为(111)面,其衍射峰强度比Cu_2O明显增强; Cd/Cu_2O样品表面与Cu_2O对比变得光滑,粒径由Cu_2O的1.0~3.0μm减小到Cd/Cu_2O的0.3~0.9μm。
        Cu_2O thin films were prepared by the one-step hydrothermal method.The effects of reaction conditions,such as the concentration of CuSO_4(cCuSO_4),concentration of NaOH(cNaOH),reaction time,reaction temperature and concentration of CdSO_4 on the photoelectric properties of the Cu_2O and Cd/Cu_2O thin films were discussed.The results show that when the copper sheet is inserted into the reactor and placed in the oven at 90 ℃ for 8 h,cCuSO_4 in the reactor is 0.114 2 mol/L,cNaOHis 0.028 6 mol/L,the concentration of CdSO_4 is 0 mol/L or 0.571 4 μmol/L,the Cu_2O thin films with the highest photovoltage of 0.366 7 V and the Cd/Cu_2O thin films with the highest photovoltage of 0.460 2 V are obtained respectively.The characterization results of the Ultraviolet-visible spectroscopy(UV-Vis),X-ray diffraction(XRD) spectrum,energy dispersive spectrometer(EDS) and scanning electron microscope(SEM) indicate that the bandgap of Cu_2O is 2.1 eV,while that of Cd/Cu_2O is at least 1.8 eV.The preferred growth surface of Cd/Cu_2O is(111) plane,and its diffraction peak intensity is obviously stronger than that of Cu_2O.The surface of Cd/Cu_2O sample is smoother than that of Cu_2O,and the particle size is reduced from 1.0-3.0 μm for Cu_2O to 0.3-0.9 μm for Cd/Cu_2O.
引文
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