UV/NaClO高级氧化法降解再生水中磺胺甲恶唑
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摘要
为了提高再生水水质,采用UV/NaClO高级氧化法降解水中的磺胺甲恶唑(SMX),对比各种降解方法对SMX的去除效果,研究影响UV/NaClO降解SMX的因素,考察消毒副产物三氯甲烷(CHCl_3)的产生情况,研究SMX在实际再生水中的去除效果.研究表明,UV/NaClO降解SMX的速率常数是单独UV、单独NaClO、UV/H_2O_23种处理方法的3.9、60、2.5倍,降解的最佳pH为3～8;NaClO投量会影响去除效果,在SMX初始浓度为1μmol/L,pH为7.4的条件下,最佳投量为0.1 mmol/L;污水厂二级出水和水环境中普遍存在的腐殖酸会与SMX竞争活性自由基和光子,降低了SMX去除率;与单独NaClO处理相比,利用UV/NaClO工艺能够明显减少水中三氯甲烷的产生;SMX在实验室超滤机过滤后的自来水中的降解速率是在实际再生水中的6.8倍.
The UV/NaClO advanced oxidation process was applied to degrade sulfamethoxazole(SMX) in order to improve reclaimed water quality. The effects of various degradation processes on SMX removal were compared. The factors influencing the decay of SMX by UV/NaClO process and the formation of disinfection by-products trichloromethane(CHCl_3) were analyzed. The performance of the UV/NaClO process for degrading SMX in real reclaimed water was analyzed. Results show that the degradation rate constants of SMX in UV/NaClO process was respectively 3.9, 60 and 2.5 times faster than the method of UV, chlorination alone and UV/H_2O_2 and the degradation conducted better at pH 3～8. The rate of SMX degradation peaked at oxidant dosage of 0.1 mmol/L at the conditions of 1μmol/L SMX and pH 7.4. Humic acid(HA) prevailing in secondary effluent of wastewater treatment plant and water environment decreased the SMX degradation by competing photons and active radicals with target contaminant. The less formation of trichloromethane was observed in UV/NaClO process compared with chlorination alone. The degradation rates observed in laboratory level was 6.8 times than that in real reclaimed water.
The UV/NaClO advanced oxidation process was applied to degrade sulfamethoxazole(SMX) in order to improve reclaimed water quality. The effects of various degradation processes on SMX removal were compared. The factors influencing the decay of SMX by UV/NaClO process and the formation of disinfection by-products trichloromethane(CHCl_3) were analyzed. The performance of the UV/NaClO process for degrading SMX in real reclaimed water was analyzed. Results show that the degradation rate constants of SMX in UV/NaClO process was respectively 3.9, 60 and 2.5 times faster than the method of UV, chlorination alone and UV/H_2O_2 and the degradation conducted better at pH 3～8. The rate of SMX degradation peaked at oxidant dosage of 0.1 mmol/L at the conditions of 1μmol/L SMX and pH 7.4. Humic acid(HA) prevailing in secondary effluent of wastewater treatment plant and water environment decreased the SMX degradation by competing photons and active radicals with target contaminant. The less formation of trichloromethane was observed in UV/NaClO process compared with chlorination alone. The degradation rates observed in laboratory level was 6.8 times than that in real reclaimed water.
引文
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[20]RAZAVI B, ABDELMELEK S B, SONG W, et al.Photochemical fate of atorvastatin(lipitor)in simulated natural waters[J]. Water Research, 2011,45(2):625-631.
[21]KEEN O S,LOVE N G,LINDEN K G. The role of effluent nitrate in trace organic chemical oxidation during UV disinfection[J]. Water Research, 2012,46(16):5224-5234.
[22]WAMMER K H,KORTE A R, LUNDEEN R A,et al.Direct photochemistry of three fluoroquinolone antibacterials:norfloxacin, ofloxacin, and enrofloxacin[J]. Water Research, 2013, 47(1):439-448.
[2]KIM K R, OWENS G, KWON S I, et al. Occurrence and environmental fate of veterinary antibiotics in the terrestrial environment[J]. Water, Air and Soil Pollution, 2011,214(1):163-174.
[3]徐永刚,宇万太,马强,等.环境中抗生素及其生态毒性效应研究进展[J].生态毒理学报,2015, 10(3):11-27.XU Yong-gang, YU Wan-tai, MA Qiang, et al. The antibiotic in environment and its ecotoxicity:a review[J]. Asian Journal of Ecotoxicology, 2015,10(3):11-27.
[4]王丹,隋倩,赵文涛,等.中国地表水环境中药物和个人护理品的研究进展[J].科学通报,2014, 59(9):743-751.WANG Dan, SUI Qian, ZHAO Wen-tao, et al.Research progress of drugs and personal care products in China's surface water environment[J].Chinese Science Bulletin, 2014, 59(9):743-751.
[5]VERLICCHI P,AUKIDY M A,ZAMBELLO E.Occurrence of pharmaceutical compounds in urban wastewater:removal, mass load and environmental risk after a secondary treatment-a review[J].Science of the Total Environment, 2012, 429(7):123.
[6]HU J Y,CHANG H,WANG L Z,et al. Occurrence of sulfonamide antibiotics in sewage treatment plants[J]. Science Bulletin, 2008, 53(4):514-520.
[7]李炳华,杨春.我国再生水中有毒有机污染物残留水平及处理技术研究进展[J].给水排水,2011,37(增1):259-264.LI Bing-hua, YANG Chun. Research progress of residual levels of toxic organic pollutants and treatment technologies in reclaimed water in China[J]. Water and Wastewater Engineering,2011,37(Suppl.1):259-264.
[8]CHANG H, HU J Y, WANG L Z, et al. Occurrence of sulfonamide antibiotics in sewage treatment plants[J]. Chinese Science Bulletin, 2008, 53(4):514-520.
[9]JIN J,EL-DIN M G,BOLTON J R. Assessment of the UV/Chlorine process as an advanced oxidation process[J]. Water Research, 2011, 45(4):1890-1896.
[10]FANG J, FU Y, SHANG C. The roles of reactive species in micropollutant degradation in the UV/free chlorine system[J]. Environmental Science and Technology, 2014, 48(3):1859-1868.
[11]SICHEL C, GARCIA C, ANDRE K. Feasibility studies:UV/chlorine advanced oxidation treatment for the removal of emerging contaminants[J]. Water Research, 2011, 45(19):6371-6380.
[12]SIFUNA F W,ORATA F, OKELLO V, et al.Comparative studies in electrochemical degradation of sulfamethoxazole and diclofenac in water by using various electrodes and phosphate and sulfate supporting electrolytes[J]. Environmental Letters,2016, 51(11):954-961.
[13]GAO S,ZHAO Z,XU Y,et al. Oxidation of sulfamethoxazole(SMX)by chlorine,ozone and permanganate--a comparative study[J]. Journal of Hazardous Materials, 2014, 274(12):258-269.
[14]XIANG Y,FANG J,SHANG C. Kinetics and pathways of ibuprofen degradation by the UV/chlorine advanced oxidation process[J]. Water Research, 2016, 90:301-308.
[15]YANG X, SUN J, FU W, et al. PPCP degradation by UV/chlorine treatment and its impact on DBP formation potential in real waters[J]. Water Research,2016, 98:309-318.
[16]GREBEL J E, PIGNATELLO J J, MITCH W A.Effect of halide ions and carbonates on organic contaminant degradation by hydroxyl radical-based advanced oxidation processes in saline waters[J].Environmental Science and Technology, 2010,44(17):6822-6828.
[17]FENG Y F, SMITH S D W, BOLTON J R.Corrigendum:photolysis of aqueous free chlorine species(HOCl and OCl-)with 254 nm ultraxiolet light[J]. Journal of Environmental Engineeringand Science,2007, 6(1):179-180.
[18]DODD M C, HUANG C H. Transformation of the antibacterial agent sulfamethoxazole in reactions with chlorine:kinetics, mechanisms. and pathways[J]. Environmental Science and Technology, 2004, 38(21):5607-5615.
[19]DLUGOSZ M,ZMUDZKI P, KWIECIEN A, et al.Photocatalytic degradation of sulfamethoxazole in aqueous solution using a floating TiO2-expanded perlite photocatalyst[J]. Journal of Hazardous Materials,2015, 298:146-153.
[20]RAZAVI B, ABDELMELEK S B, SONG W, et al.Photochemical fate of atorvastatin(lipitor)in simulated natural waters[J]. Water Research, 2011,45(2):625-631.
[21]KEEN O S,LOVE N G,LINDEN K G. The role of effluent nitrate in trace organic chemical oxidation during UV disinfection[J]. Water Research, 2012,46(16):5224-5234.
[22]WAMMER K H,KORTE A R, LUNDEEN R A,et al.Direct photochemistry of three fluoroquinolone antibacterials:norfloxacin, ofloxacin, and enrofloxacin[J]. Water Research, 2013, 47(1):439-448.