光电极值法结合外差干涉法监控膜厚的研究
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摘要
光电极值法是光学薄膜厚度监测的常用方法,该方法在镀膜前引用块状材料的折射率设计膜系。而在实际镀制过程中,用于镀制光学薄膜的材料折射率会发生改变,从而给膜厚的监控带来误差。为了避免折射率变化的影响,采用外差干涉法测量折射率,将实际测得的薄膜折射率应用光电极值法监控薄膜的设计,从而减少了因材料折射率的变化引起的误差。以750nm截止滤光片的镀制为被测对象进行了实验,对制备的滤光片透射率光谱曲线进行了比较。结果表明,实际的透射率曲线与设计的透射率曲线吻合较好,两次实验曲线平均吻合度均在98%以上,系统稳定性很好,从而说明结合外差干涉法的光电极值监控法可以很好地克服折射率变化引起的误差。
Photoelectric extreme value method is a common method to monitor the optical film.The index of a bulk material is applied on the design of film before plating.However,the index of the optical film will change during the actual deposition process,which leads the error to the monitoring of an optical film.In order to avoid the influence of refractive index,a heterodyne interferometry method is used to measure refractive index and then the measured refractive index is considered in the design of the film,which can reduce the error caused by the changes of refractive index.A filter with cutoff wavelength 750 nm is used as the object and the transmittance spectra are compared using photoelectric extreme value method and the photoelectric extreme value method combined with heterodyne interferometry.The results show that the actual transmittance curve is in good agreement with design and the agreement is more than 98% on average.The stability is satisfied,which verifies that photoelectric extreme value method combined with heterodyne interferometry can overcome the error of the changes of refractive index very well.
Photoelectric extreme value method is a common method to monitor the optical film.The index of a bulk material is applied on the design of film before plating.However,the index of the optical film will change during the actual deposition process,which leads the error to the monitoring of an optical film.In order to avoid the influence of refractive index,a heterodyne interferometry method is used to measure refractive index and then the measured refractive index is considered in the design of the film,which can reduce the error caused by the changes of refractive index.A filter with cutoff wavelength 750 nm is used as the object and the transmittance spectra are compared using photoelectric extreme value method and the photoelectric extreme value method combined with heterodyne interferometry.The results show that the actual transmittance curve is in good agreement with design and the agreement is more than 98% on average.The stability is satisfied,which verifies that photoelectric extreme value method combined with heterodyne interferometry can overcome the error of the changes of refractive index very well.
引文
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[3]廖振兴,等,光学薄膜膜厚监控方法及其进展[J].激光杂志,2004,25(4):10—12.LIAO Zhenxing,et al.The progress of optical thin film thickness monitoring[J].Laser Journal,2004,25(4):10—12.
[4]唐晋发,等.现代光学薄膜技术[M].杭州:浙江大学出版社,2007:260—263.TANG Jinfa,et al.Modern optical thin film technology[M].Hangzhou:Zhejiang University press,2007:260—263.
[5]权贵秦,等.一种基于光电极值法的光学膜厚监控系统的改进设计[J].应用光学,2002,23(4):30.QUAN Guiqin,et al.A kind of improve design for system of optical thin-film thickness monitoring control based on the method of photoelectricity limiting value[J].Applied Optics,2002,23(4):30.
[6]景娟娟,等.干涉光谱数据处理技术研究进展[J].光谱学与光谱分析,2011,31(4):865—870.JING Juanjuan1,et al.Advance in interferogram data processing technique[J].Spectroscopy and Spectral Analysis,2011,31(4):865—870.
[7]陈德军,等.一种监控非规整膜系的新方法[J].光电工程,2004,31(6):37—40.CHEN Dejun,et al.A novel method for monitoring non-normalized coating system[J].Opto-Electronic Engineering,2004,31(6):37—40.
[8]SU D C,et al.Complex refractive index measurements based on Fresnel's equations and the uses of a lock-in amplifier[J].Applied Optics,2008,38(19):22—31.
[9]LOGOFATU P C,et al.Optimum angles for determining the optical constants from reflectivity measurements[J].Meas Sci Technol,1996,7(1):52—57.
[10]孔伟金,等.极值法膜厚控制的误差分析及其改进设计[J].光学技术,2003,29(6):696—701.KONG Weijin,et al.Study on extreme value method of monitoring thin film error and the improvement of the system[J].Optical Technique,2003,29(6):696—701.
[11]傅晶晶,等.红外上转换材料测试系统中截止滤光片的研制[J].激光与光电子学进展,2015,52(083102):2—3.FU Jingjing,et al.Fabrication of edge filter on a testing system for infrared up-conversion materials[J].Laser&Optoelectronnics Progress,2015,52(083102):2—3.
[12]顾培夫,等.薄膜截止滤光片的消偏振设计[J].光学学报,2005,25(2):274—278.GU Peifu,et al.Design of depolarization thin film cutoff filters[J].Acta Optica Sinica,2005,25(2):274—278.
[13]付秀华,等.589nm激光器光路整合系统滤光膜的研制[J].中国激光,2003,40(3):157—161.FU Xiuhua,et al.Design and fabrication of 589nm laser optical path integration system filter film[J].Chinese Journal of Lasers,2003,40(3):157—161.
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