热压增大光刻胶光栅占宽比的方法及其应用
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摘要
全息光刻-单晶硅各向异性湿法刻蚀是制作大高宽比硅光栅的一种重要方法 ,而如何增大光刻胶光栅的占宽比,以提高制作工艺宽容度和光栅质量是急需解决的问题。本文提出了一种热压增大光刻胶光栅占宽比的方法,该方法通过加热加压直接将光刻胶光栅线条展宽。论文详细阐述了其工艺过程,探究了占宽比增加值随施压载荷、温度的变化规律,讨论了施压垫片对光刻胶光栅质量的影响。应用此方法制作了周期为500nm的硅光栅,光栅线条的高宽比达到了12.6,氮化硅光栅掩模的占宽比高达0.72。热压增大光刻胶光栅占宽比的方法工艺简单、可靠,无需昂贵设备、成本低,能够有效增大占宽比,且获得的光栅掩模质量高、均匀性好,满足制作高质量大高宽比硅光栅的要求。
Holographic lithography combined with anisotropic wet etching of monocrystalline silicon is an important method for the fabrication of high-aspect-ratio silicon gratings.However,increasing the duty cycle of photoresist grating to improve the fabrication process tolerance and grating quality is a major problem.We present a method for increasing the duty cycle of photoresist grating by hot pressing.The principle of this method is to broaden the width of photoresist grating lines directly by heating and pressurizing.The fabrication process is described in detail.The variation of the duty cycle with pressure load and temperature was studied,and the influence of pressing gasket on the grating quality was investigated.Using this method,a silicon grating with a period of 500 nm was successful-ly fabricated.The aspect ratio of the grating line is 12.6,and the duty cycle of silicon nitride mask is as high as 0.72.This method is simple,reliable,and affordable.It can effectively increase the duty cycle,and the obtained grating mask has high quality and good uniformity,which meets the requirements of fabricating high-quality silicon gratings with high aspect ratios.
Holographic lithography combined with anisotropic wet etching of monocrystalline silicon is an important method for the fabrication of high-aspect-ratio silicon gratings.However,increasing the duty cycle of photoresist grating to improve the fabrication process tolerance and grating quality is a major problem.We present a method for increasing the duty cycle of photoresist grating by hot pressing.The principle of this method is to broaden the width of photoresist grating lines directly by heating and pressurizing.The fabrication process is described in detail.The variation of the duty cycle with pressure load and temperature was studied,and the influence of pressing gasket on the grating quality was investigated.Using this method,a silicon grating with a period of 500 nm was successful-ly fabricated.The aspect ratio of the grating line is 12.6,and the duty cycle of silicon nitride mask is as high as 0.72.This method is simple,reliable,and affordable.It can effectively increase the duty cycle,and the obtained grating mask has high quality and good uniformity,which meets the requirements of fabricating high-quality silicon gratings with high aspect ratios.
引文
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[16] LI H L,YE T CH,SHI L N,et al..Fabrication of ultra-high aspect ratio(>160:1)silicon nanostructures by using Au metal assisted chemical etching[J].Journal of Micromechanics and Microengineering,2017,27(12):124002.
[17] CHANG C,SAKDINAWAT A.Ultra-high aspect ratio high-resolution nanofabrication for hard X-ray diffractive optics[J].Nature Communications,2014,5:4243.
[18]陈勇.软X射线自支撑闪耀透射光栅的制作[D].合肥:中国科学技术大学,2013.CHEN Y.Fabrication of Soft X-ray Freestanding Blazed Transmission Gratings[D].Hefei:University of Science and Technology of China,2013.(in Chinese)
[19] ZHENG Y CH,QIU K Q,JIANG X L,et al..Fabrication of high aspect ratio silicon gratings by interference lithography and potassium hydroxide anisotropic etch technique[C].Nanoengineering:Fabrication,Properties,Optics,and Devices XI,San Diego,America:SPIE,2014:917018.
[20]郑衍畅.高线密度X射线自支撑闪耀透射光栅的制作[D].合肥:中国科学技术大学,2015.ZHENG Y CH.Fabrication of High Groove Density Freestanding X-ray Blazed Transmission Gratings[D].Hefei:University of Science and Technology of China,2015.(in Chinese)
[21]邱克强,刘正坤,徐向东,等.全息光刻中的驻波效应研究[J].物理学报,2012,61(1):014204.QIU K Q,LIU ZH K,XU X D,et al..Standing wave in holographic lithography[J].Acta Phys.Sin.,2012,61(1):014204.(in Chinese)
[22] ZHENG Y CH,QIU K Q,CHEN H Y,et al..Alignment method combining interference lithography with anisotropic wet etch technique for fabrication of high aspect ratio silicon gratings[J].Optics Express,2014,22(19):23592-23604.
[2] TAKANO H,WU Y L,IRWIN J,et al..Comparison of image properties in full-field phase X-ray microscopes based on grating interferometry and Zernike′s phase contrast optics[J].Applied Physics Letters,2018,113(6):063105.
[3] SARENAC D,PUSHIN D A,HUBER M G,et al..Three phase-grating Moiréneutron interferometer for large interferometer area applications[J].Physical Review Letters,2018,120(11):113201.
[4] KIM Y,KIM J,KIM D,et al..Feasibility evaluation of a neutron grating interferometer with an analyzer grating based on a structured scintillator[J].Review of Scientific Instruments,2018,89(3):033701.
[5]陈宜方.X射线衍射光学部件的制备及其光学性能表征[J].光学精密工程,2017,25(11):2779-2795.CHEN Y F.Fabrication of diffractive X-ray optics and their performance characterization[J].Opt.Precision Eng.,2017,25(11):2779-2795.(in Chinese)
[6] PFEIFFER F,BUNK O,SCHULZE-BRIESE C,et al..Shearing interferometer for quantifying the coherence of hard X-ray beams[J].Physical Review Letters,2005,94(16):164801.
[7] WANG B Q,YI T,WANG CH K,et al..Design of time-resolved shifted dual transmission grating spectrometer for the X-ray spectrum diagnostics[J].Plasma Science and Technology,2016,18(7):781-785.
[8] HEILMANN R K, BRUCCOLERIAR,KOLODZIEJCZAK J,et al..Critical-angle x-ray transmission grating spectrometer with extended bandpass and resolving power> 10,000[C].Space Telescopes and Instrumentation 2016:Ultraviolet to Gamma Ray,Edinburgh,SCOTLAND:SPIE,2016:99051X.
[9] HEILMANN R K,BRUCCOLERI A R,SONG J,et al..Critical-angle transmission grating technology development for high resolving power soft x-ray spectrometers on Arcus and Lynx[C].Optics for EUV,X-Ray,and Gamma-Ray Astronomy VIII,San Diego,AMERICA:SPIE,2017:1039914.
[10]褚金奎,康维东,曾祥伟,等.基于柔性纳米压印工艺制备中红外双层金属纳米光栅[J].光学精密工程,2017,25(12):3034-3040.CHU J K,KANG W D,ZENG X W,et al..Fabrication of bilayer metallic nano gratings in mid-infrared region based on flexible nanoimprint lithography[J].Opt.Precision Eng.,2017,25(12):3034-3040.(in Chinese)
[11]MUKHERJEE P,ZURBUCHEN T H,GUO L J.Fabrication and testing of freestanding Si nanogratings for UV filtration on space-based particle sensors[J].Nanotechnology,2009,20(32):325301.
[12]梁榉曦,郑衍畅,邱克强,等.<111>晶向标定方法及其在湿法刻蚀硅光栅中的应用[J].光学精密工程,2018,26(1):1-7.LIANG J X,ZHENG Y CH,QIU K Q,et al..Calibration method of silicon <111> orientation and its application in fabrication of silicon grating by anisotropic wet etching[J].Opt.Precision Eng.,2018,26(1):1-7.(in Chinese)
[13]陈勇,邱克强,徐向东,等.1000线/毫米软X射线自支撑闪耀透射光栅的设计与制作[J].物理学报,2012,61(12):120702.CHEN Y,QIU K Q,XU X D,et al..Design and fabrication of 1000line/mm soft X-ray freestanding blazed transmission gratings[J]. Acta Phys.Sin.,2012,61(12):120702.(in Chinese)
[14] AHN M,HEILMANN R K,SCHATTENBURG M L.Fabrication of ultrahigh aspect ratio freestanding gratings on silicon-on-insulator wafers[J].Journal of Vacuum Science&Technology B:Microelectronics and Nanometer Structures Processing,Measurement,and Phenomena,2007,25(6):2593-2597.
[15] HEILMANN R K,AHN M,GULLIKSON E M,et al..Blazed high-efficiency x-ray diffraction via transmission through arrays of nanometer-scale mirrors[J].Optics Express,2008,16(12):8658-8669.
[16] LI H L,YE T CH,SHI L N,et al..Fabrication of ultra-high aspect ratio(>160:1)silicon nanostructures by using Au metal assisted chemical etching[J].Journal of Micromechanics and Microengineering,2017,27(12):124002.
[17] CHANG C,SAKDINAWAT A.Ultra-high aspect ratio high-resolution nanofabrication for hard X-ray diffractive optics[J].Nature Communications,2014,5:4243.
[18]陈勇.软X射线自支撑闪耀透射光栅的制作[D].合肥:中国科学技术大学,2013.CHEN Y.Fabrication of Soft X-ray Freestanding Blazed Transmission Gratings[D].Hefei:University of Science and Technology of China,2013.(in Chinese)
[19] ZHENG Y CH,QIU K Q,JIANG X L,et al..Fabrication of high aspect ratio silicon gratings by interference lithography and potassium hydroxide anisotropic etch technique[C].Nanoengineering:Fabrication,Properties,Optics,and Devices XI,San Diego,America:SPIE,2014:917018.
[20]郑衍畅.高线密度X射线自支撑闪耀透射光栅的制作[D].合肥:中国科学技术大学,2015.ZHENG Y CH.Fabrication of High Groove Density Freestanding X-ray Blazed Transmission Gratings[D].Hefei:University of Science and Technology of China,2015.(in Chinese)
[21]邱克强,刘正坤,徐向东,等.全息光刻中的驻波效应研究[J].物理学报,2012,61(1):014204.QIU K Q,LIU ZH K,XU X D,et al..Standing wave in holographic lithography[J].Acta Phys.Sin.,2012,61(1):014204.(in Chinese)
[22] ZHENG Y CH,QIU K Q,CHEN H Y,et al..Alignment method combining interference lithography with anisotropic wet etch technique for fabrication of high aspect ratio silicon gratings[J].Optics Express,2014,22(19):23592-23604.