扫描探针显微镜下微纳结构深度测量的校准方法（英文）
|
摘要
扫描探针显微镜(SPM)是微纳结构三维测量中的一项重要技术。然而,在测量过程中台阶或沟槽样品的边缘附近会出现不准确的轮廓,这就造成了深度测量的精度损失。为了避免深度测量的精度损失,分别建立了机械探针和光学探针的两个分析模型,描述了不准确轮廓、样品深度和探针形状之间的耦合关系;在此基础上,提出了一种具有良好精度的深度测量标定方法。与现有的国际深度测量标准(W/3规则)进行比较,该方法提供了一个明确的边界来确定测量结果是否有效;此外,它还可以指导用户在执行测量之前选择适当的探针。
Scanning probe microscopy( SPM) is an essential technology for three-dimensional measurement of nano/microstructure. However,there are uncertain profiles near step or groove sample edges,which bring about accuracy loss of depth measurement. In order to avoid the accuracy loss of depth measurement,two analytical models for mechanical probes and optical probes were established respectively,the coupling relationships among uncertain profiles,depth of samples,and shape of probes were depicted. Based on the above models,a calibration method for depth measurement with a promising accuracy was proposed. Compared with the existing international standard for depth measurement( W/3 rule),the proposed method provides a clear boundary to determine if the measurement results are valid. Furthermore,it can also guide the user to select the appropriate probe before performing measurements.
Scanning probe microscopy( SPM) is an essential technology for three-dimensional measurement of nano/microstructure. However,there are uncertain profiles near step or groove sample edges,which bring about accuracy loss of depth measurement. In order to avoid the accuracy loss of depth measurement,two analytical models for mechanical probes and optical probes were established respectively,the coupling relationships among uncertain profiles,depth of samples,and shape of probes were depicted. Based on the above models,a calibration method for depth measurement with a promising accuracy was proposed. Compared with the existing international standard for depth measurement( W/3 rule),the proposed method provides a clear boundary to determine if the measurement results are valid. Furthermore,it can also guide the user to select the appropriate probe before performing measurements.
引文
[1]Boccaccio A,Lamberti L,Papi M,et al.Effect of AFMprobe geometry on visco-hyperelastic characterization of soft materials.[J].Nanotechnology,2015,26(32):325701.
[2]Cordes A,Bunday B D.Sidewall slope sensitivity of critical dimension atomic force microscopy[J].Journal of Micro/Nanolithography Mems&Moems,2012,11(1):011011.
[3]Bosse J L,Huey B D.Error-corrected AFM:a simple and broadly applicable approach for substantially improving AFM image accuracy[J].Nanotechnology,2014,25(15):155704.
[4]Seah M P.Nanoscale roughness and bias in step height measurements by atomic force microscopy[J].Measurement Science&Technology,2013,24(3):035004.
[5]CharvátováCampbell A,Jelínek P,Klapetek P.Study of uncertainties of height measurements of monoatomic steps on Si 5×5 using DFT[J].Measurement Science&Technology,2017,28(3):034005.
[6]Liu J,Liu C,Tan J,et al.Super-aperture metrology:overcoming a fundamental limit in imaging smooth highly curved surfaces[J].J Microsc,2016,261(3):300-306.
[7]Lim J,Jung M,Joo C,et al.Development of microobjective lens array for large field-of-view multi-optical probe confocal microscopy[J].Journal of Micromechanics&Microengineering,2013,23(6):065028.
[8]Demming A.Scanning probe microscopy:a visionary development[J].Nanotechnology,2013,24(29):290201.
[9]Valdre G,Moro D.Scanning probe microscopy with vertically oriented cantilevers made easy[J].Measurement Science&Technology,2012,23(8):126103-126103-3.
[10]Ritter M.A landmark-based 3D calibration strategy for SPM[J].Meas.sci.technol,2007,18(2):404.
[11]ISO 5436-1:2000(E)Geometrical product specifications(GPS)-Surface texture:Profile method;Measurement standards-Part 1:Material measures[S].
[12]Liu J,Li M,Li Q,et al.Decoupling criterion based on limited energy loss condition for groove measurement using optical scanning microscopes[J].Measurement Science&Technology,2016,27(12):125014.
[2]Cordes A,Bunday B D.Sidewall slope sensitivity of critical dimension atomic force microscopy[J].Journal of Micro/Nanolithography Mems&Moems,2012,11(1):011011.
[3]Bosse J L,Huey B D.Error-corrected AFM:a simple and broadly applicable approach for substantially improving AFM image accuracy[J].Nanotechnology,2014,25(15):155704.
[4]Seah M P.Nanoscale roughness and bias in step height measurements by atomic force microscopy[J].Measurement Science&Technology,2013,24(3):035004.
[5]CharvátováCampbell A,Jelínek P,Klapetek P.Study of uncertainties of height measurements of monoatomic steps on Si 5×5 using DFT[J].Measurement Science&Technology,2017,28(3):034005.
[6]Liu J,Liu C,Tan J,et al.Super-aperture metrology:overcoming a fundamental limit in imaging smooth highly curved surfaces[J].J Microsc,2016,261(3):300-306.
[7]Lim J,Jung M,Joo C,et al.Development of microobjective lens array for large field-of-view multi-optical probe confocal microscopy[J].Journal of Micromechanics&Microengineering,2013,23(6):065028.
[8]Demming A.Scanning probe microscopy:a visionary development[J].Nanotechnology,2013,24(29):290201.
[9]Valdre G,Moro D.Scanning probe microscopy with vertically oriented cantilevers made easy[J].Measurement Science&Technology,2012,23(8):126103-126103-3.
[10]Ritter M.A landmark-based 3D calibration strategy for SPM[J].Meas.sci.technol,2007,18(2):404.
[11]ISO 5436-1:2000(E)Geometrical product specifications(GPS)-Surface texture:Profile method;Measurement standards-Part 1:Material measures[S].
[12]Liu J,Li M,Li Q,et al.Decoupling criterion based on limited energy loss condition for groove measurement using optical scanning microscopes[J].Measurement Science&Technology,2016,27(12):125014.
© 2004-2018 中国地质图书馆版权所有 京ICP备05064691号 京公网安备11010802017129号 地址：北京市海淀区学院路29号 邮编：100083 电话：办公室：(+86 10)66554848；文献借阅、咨询服务、科技查新：66554700 |