摘要
综述了Ti O_2薄膜的光生阴极保护基本原理、制备技术及其改性和复合的研究现状。探讨了Ti O_2基薄膜制备技术的优缺点,分析了Ti O_2基薄膜微观结构、离子掺杂、贵金属表面沉积及复合材料对光生阴极保护的影响及其作用机理。最后,对Ti O_2基薄膜光生阴极保护的未来前景进行了展望。
In this work,the mechanism of photo-cathodic protection of Ti O2-based films was introduced,and the research progress of preparation technology and modification were reviewed. The characteristics of the preparation technology of Ti O2-based films were discussed,and the influencing mechanisms of microstructure,ion doping,precious-metal deposition and composite materials on the photo-cathodic protection of Ti O2-based films were further analyzed. As last,the future development on the photo-cathodic protection of Ti O2-based films was forecasted.
引文
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