Moir茅 Nanosphere Lithography
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- 作者：Kai Chen ; Bharath Bangalore Rajeeva ; Zilong Wu ; Michael Rukavina ; Thang Duy Dao ; Satoshi Ishii ; Masakazu Aono ; Tadaaki Nagao ; Yuebing Zheng
- 刊名：ACS Nano
- 出版年：2015
- 出版时间：June 23, 2015
- 年：2015
- 卷：9
- 期：6
- 页码：6031-6040
- 全文大小：1067K
- ISSN：1936-086X
文摘
We have developed moir茅 nanosphere lithography (M-NSL), which incorporates in-plane rotation between neighboring monolayers, to extend the patterning capability of conventional nanosphere lithography (NSL). NSL, which uses self-assembled layers of monodisperse micro/nanospheres as masks, is a low-cost, scalable nanofabrication technique and has been widely employed to fabricate various nanoparticle arrays. Combination with dry etching and/or angled deposition has greatly enriched the family of nanoparticles NSL can yield. In this work, we introduce a variant of this technique, which uses sequential stacking of polystyrene nanosphere monolayers to form a bilayer crystal instead of conventional spontaneous self-assembly. Sequential stacking leads to the formation of moir茅 patterns other than the usually observed thermodynamically stable configurations. Subsequent O2 plasma etching results in a variety of complex nanostructures. Using the etched moir茅 patterns as masks, we have fabricated complementary gold nanostructures and studied their optical properties. We believe this facile technique provides a strategy to fabricate complex nanostructures or metasurfaces.