Ni Layer Thickness Dependence of the Interface Structures for Ti/Ni/Ti Trilayer Studied by X-ray Standing Waves
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- 作者：Wenbin Li ; Jingtao Zhu ; Haochuan Li ; Zhong Zhang ; Xiaoying Ma ; Xiaoyue Yang ; Hongchang Wang ; Zhanshan Wang
- 刊名：ACS Applied Materials & Interfaces
- 出版年：2013
- 出版时间：January 23, 2013
- 年：2013
- 卷：5
- 期：2
- 页码：404-409
- 全文大小：404K
- 年卷期：v.5,no.2(January 23, 2013)
- ISSN：1944-8252
文摘
X-ray standing waves generated by periodic multilayers have been used to characterize the interface microstructures of Ti/Ni/Ti trilayers based on the X-ray reflectivity (XRR) and grazing incidence X-ray fluorescence (GIXRF) methods. For the Ni layer having thickness of 1.7 nm, it is observed that the roughness of Ti-on-Ni interface is 0.64 nm and that of Ni-on-Ti interface is 0.40 nm, which can be explained by an additional roughness on the Ti-on-Ni interface induced by the nucleation of Ni crystallites when the Ni layer thickness is at the amorphous-to-crystalline transition region. For the Ni layer thickness of 3.3 nm beyond this transition region, the roughness of Ti-on-Ni interface is 0.42 nm and Ni-on-Ti interface is 0.46 nm, which is consistent with the expectation on wetting and dewetting conditions.