Nanoporous Materials with Spherical and Gyroid Cavities Created by Quantitative Etching of Polydimethylsiloxane in Polystyrene-Polydimethylsiloxane Block Copolymers
详细信息 查看全文
- 作者：Sokol Ndoni ; Martin E. Vigild ; and Rolf H. Berg
- 刊名：Journal of the American Chemical Society
- 出版年：2003
- 出版时间：November 5, 2003
- 年：2003
- 卷：125
- 期：44
- 页码：13366 - 13367
- 全文大小：81K
- 年卷期：v.125,no.44(November 5, 2003)
- ISSN：1520-5126
文摘
A new method for quantitative etching of the poly(dimethylsiloxane) block in polystyrene-poly(dimethylsiloxane) (PS-PDMS) block copolymers is reported. Reacting the block copolymer with anhydrous hydrogen fluoride renders a nanoporous material (NPM) with the remaining glassy PS maintaining the original bulk morphology. 1H NMR, mass difference, size exclusion chromatography, and X-ray photoelectron spectroscopy were used to characterize the materials before and after etching. NPMs containing spherical and gyroid cavities were prepared, as ascertained by small-angle X-ray scattering. This is the first report on block copolymer-based NPM films of millimeter thickness containing secluded spherical holes. Surface images by AFM and SEM are consistent with the SAXS findings.