Strain Relaxation in CVD Graphene: Wrinkling with Shear Lag

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• 作者：Merijntje S. Bronsgeest ; Nedjma Bendiab ; Shashank Mathur ; Amina Kimouche ; Harley T. Johnson ; Johann Coraux ; Pascal Pochet
• 刊名：Nano Letters
• 出版年：2015
• 出版时间：August 12, 2015
• 年：2015
• 卷：15
• 期：8
• 页码：5098-5104
• 全文大小：425K
• ISSN：1530-6992

文摘

We measure uniaxial strain fields in the vicinity of edges and wrinkles in graphene prepared by chemical vapor deposition (CVD), by combining microscopy techniques and local vibrational characterization. These strain fields have magnitudes of several tenths of a percent and extend across micrometer distances. The nonlinear shear-lag model remarkably captures these strain fields in terms of the graphene鈥搒ubstrate interaction and provides a complete understanding of strain-relieving wrinkles in graphene for any level of graphene鈥搒ubstrate coherency.