Selective Insertion of Sulfur Dioxide Reduction Intermediates on Graphene Oxide

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• 作者：Eduardo Humeres ; Nito A. Debacher ; Alessandra Smaniotto ; Karen M. de Castro ; Lu铆s O. B. Benetoli ; Eduardo P. de Souza ; Regina de F. P. M. Moreira ; Cristiane N. Lopes ; Wido H. Schreiner ; Mois茅s Canle ; J. Arturo Santaballa
• 刊名：Langmuir
• 出版年：2014
• 出版时间：April 22, 2014
• 年：2014
• 卷：30
• 期：15
• 页码：4301-4309
• 全文大小：451K
• 年卷期：v.30,no.15(April 22, 2014)
• ISSN：1520-5827

文摘

Graphite microparticles (d₅₀ 6.20 渭m) were oxidized by strong acids, and the resultant graphite oxide was thermally exfoliated to graphene oxide sheets (MPGO, C/O 1.53). Graphene oxide was treated with nonthermal plasma under a SO₂ atmosphere at room temperature. The XPS spectrum showed that SO₂ was inserted only as the oxidized intermediate at 168.7 eV in the S 2p region. Short thermal shocks at 600 and 400 掳C, under an Ar atmosphere, produced reduced sulfur and carbon dioxide as shown by the XPS spectrum and TGA analysis coupled to FTIR. MPGO was also submitted to thermal reaction with SO₂ at 630 掳C, and the XPS spectrum in the S 2p region at 164.0 eV showed that this time only the nonoxidized episulfide intermediate was inserted. Plasma and thermal treatment produced a partial reduction of MPGO. The sequence of thermal reaction followed by plasma treatment inserted both sulfur intermediates. Because oxidized and nonoxidized intermediates have different reactivities, this selective insertion would allow the addition of selective types of organic fragments to the surface of graphene oxide.