Superhydrophobic Patterned Film Fabricated from DNA Assembly and Ag Deposition
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- 作者：Linglu Yang ; Shuo Bai ; Dunshen Zhu ; Zhaohui Yang ; Maofeng Zhang ; Zhifeng Zhang ; Erqiang Chen ; Weixiao Cao
- 刊名：Journal of Physical Chemistry C
- 出版年：2007
- 出版时间：January 11, 2007
- 年：2007
- 卷：111
- 期：1
- 页码：431 - 434
- 全文大小：361K
- 年卷期：v.111,no.1(January 11, 2007)
- ISSN：1932-7455
文摘
In this article we obtained a superhydrophobic patterned Ag film mainly by two steps. The first step is tofabricate a DNA film pattern through poly(dimethyldiallylammonium chloride) alternate deposition with DNAon a latent imaging film formed by the selective UV exposure of a photosensitive diazoresin/poly(acrylicacid) self-assembly (SA) film. The second step is to build up the patterned Ag film on a DNA film patternwith Ag electroless deposition. After surface modification with n-dodecanethiol the patterned Ag film, whichexhibits obvious microstructures and nanostructures, will possess superhydrophobic properties and the contactangle can reach ~162
.
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