文摘
Metal oxide doping caused changes in properties of mesoporous SiO2. V4 +/V5 +, Mn4 +, and Cu+/Cu2 + were major valence states in doped SiO2. XRD indicated amorphous/highly dispersed metal oxides presenting in doped SiO2. Simultaneous removal of Hg0 and NO can be achieved with doped SiO2. CuOx-doped SiO2 had the greatest Hg0 and NO removal performance.